• DocumentCode
    2274962
  • Title

    The effects of block oxide length (Lbo) and height (Hbo) in a bMOS

  • Author

    Kuan Kuan-Yu Chen ; Yu Chen ; Jyi-Tsong Lin ; Yi-Chuen Eng ; Shih-Wen Hsu ; Shu-Huan Syu ; You-Ren Lu

  • Author_Institution
    Dept. of Electr. Eng., Nat. Sun Yat-Sen Univ., Kaohsiung, Taiwan
  • fYear
    2012
  • fDate
    14-15 May 2012
  • Firstpage
    138
  • Lastpage
    141
  • Abstract
    In this paper, we investigate the important device characteristics of block oxide (BO) MOSFETs (bMOS), which are the BO length (Lbo) and the height (Hbo). According to the simulation results, the variation of Lbo and Hbo strongly affects the device characteristics, such as the sub-threshold swing, threshold voltage, on-state drain current (Ion), and the off-state drain current (Ioff). This is because the variation of Lbo and Hbo changes both the areas of BO and source/drain (S/D) regions, resulting in a variation of increase or decrease in the p-n junction area between the S/D regions and silicon substrate.
  • Keywords
    MOSFET; elemental semiconductors; semiconductor device manufacture; semiconductor device models; silicon; Si; bMOS; block oxide MOSFET; block oxide height effect; block oxide length effect; off-state drain current; on-state drain current; sub-threshold swing; threshold voltage; Abstracts; Logic gates; MOSFET circuits; Performance evaluation; Radio frequency; Substrates; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Junction Technology (IWJT), 2012 12th International Workshop on
  • Conference_Location
    Shanghai
  • Print_ISBN
    978-1-4673-1258-5
  • Electronic_ISBN
    978-1-4673-1256-1
  • Type

    conf

  • DOI
    10.1109/IWJT.2012.6212828
  • Filename
    6212828