DocumentCode
2274962
Title
The effects of block oxide length (Lbo ) and height (Hbo ) in a bMOS
Author
Kuan Kuan-Yu Chen ; Yu Chen ; Jyi-Tsong Lin ; Yi-Chuen Eng ; Shih-Wen Hsu ; Shu-Huan Syu ; You-Ren Lu
Author_Institution
Dept. of Electr. Eng., Nat. Sun Yat-Sen Univ., Kaohsiung, Taiwan
fYear
2012
fDate
14-15 May 2012
Firstpage
138
Lastpage
141
Abstract
In this paper, we investigate the important device characteristics of block oxide (BO) MOSFETs (bMOS), which are the BO length (Lbo) and the height (Hbo). According to the simulation results, the variation of Lbo and Hbo strongly affects the device characteristics, such as the sub-threshold swing, threshold voltage, on-state drain current (Ion), and the off-state drain current (Ioff). This is because the variation of Lbo and Hbo changes both the areas of BO and source/drain (S/D) regions, resulting in a variation of increase or decrease in the p-n junction area between the S/D regions and silicon substrate.
Keywords
MOSFET; elemental semiconductors; semiconductor device manufacture; semiconductor device models; silicon; Si; bMOS; block oxide MOSFET; block oxide height effect; block oxide length effect; off-state drain current; on-state drain current; sub-threshold swing; threshold voltage; Abstracts; Logic gates; MOSFET circuits; Performance evaluation; Radio frequency; Substrates; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Junction Technology (IWJT), 2012 12th International Workshop on
Conference_Location
Shanghai
Print_ISBN
978-1-4673-1258-5
Electronic_ISBN
978-1-4673-1256-1
Type
conf
DOI
10.1109/IWJT.2012.6212828
Filename
6212828
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