DocumentCode
2275078
Title
Quantum Well ZnCdTe/CdTe Structures with Integrated Ferroelectric Gates
Author
Stolichnov, Igor ; Colla, Enrico ; Setter, Nava ; Wojciechowski, Tomasz ; Janik, Elzbieta ; Karczewski, Grzegorz
Author_Institution
EPFL -Swiss Fed. Inst. of Technol., Lausanne
fYear
2007
fDate
27-31 May 2007
Firstpage
52
Lastpage
53
Abstract
Combination of ferroelectric layers and semiconductor heterostructures with 2D electron gas may lead to a number of new applications from high-mobility field effect transistors with ferroelectric gates to quantum dots patterned with polarization domains at sub-micron scale. One of the fundamental obstacles impeding implementation of such devices is associated with the unfavorable relation between the dielectric constants of the classical oxide ferroelectrics and semiconductors. In the present work we demonstrate a way to alleviate this problem by using a gate material that is ferroelectric and semiconducting simultaneously. First, ferroelectricity in semiconductor CdZnTe films is proven and studied using modified piezo-force scanning probe microscopy. Then a rewritable field effect device is demonstrated by local poling of the CdZnTe layer of a CdZnTe/CdTe quantum well, provoking a reversible, nonvolatile change in the resistance of the 2D electron gas.
Keywords
II-VI semiconductors; cadmium compounds; electrical resistivity; ferroelectric devices; field effect transistors; permittivity; scanning probe microscopy; semiconductor heterojunctions; semiconductor quantum dots; semiconductor quantum wells; semiconductor thin films; thin film circuits; two-dimensional electron gas; zinc compounds; 2D electron gas; ZnCdTe-CdTe; classical oxide ferroelectrics; dielectric constants; ferroelectric layers; field effect device; high-mobility field effect transistor application; integrated ferroelectric gates; local poling; piezo-force scanning probe microscopy; polarization domain-patterned quantum dot application; quantum well structures; reversible-nonvolatile resistance; semiconductor films; semiconductor heterostructures; submicron scale; Dielectric constant; Dielectric materials; Electrons; FETs; Ferroelectric materials; Impedance; Lead compounds; Polarization; Quantum dots; Semiconductor materials;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Ferroelectrics, 2007. ISAF 2007. Sixteenth IEEE International Symposium on
Conference_Location
Nara
ISSN
1099-4734
Print_ISBN
978-1-4244-1334-8
Electronic_ISBN
1099-4734
Type
conf
DOI
10.1109/ISAF.2007.4393165
Filename
4393165
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