Title :
Microstructure and corrosion behaviors of XC48 treated by rf magnetron sputtering TiAlN alloying
Author :
Madaoui, N. ; Saoula, N. ; Ait Djafer, A.Z. ; Zerizer, A.
Author_Institution :
Div. Milieux Ionises, Centre de Dev. des Technol. Av., Algiers, Algeria
Abstract :
Transition metal nitride based hard coatings such as TiN, TiAlN are chemically inert, thermally stable and, therefore, provide good corrosion protection. Deposition of hard coatingson material surface by reactive r.f magnetron sputtering methods features one of the most intensely developed directions of improvement of the working properties of materials. The PVD techniques are widely used now adays for improvement the corrosion resistance. One of the general reasons for depositing by PVD techniques is developing the protective coating presenting corrosion resistance higher than the substrate.
Keywords :
aluminium compounds; corrosion protection; corrosion protective coatings; corrosion resistance; current density; electrochemical impedance spectroscopy; optical microscopy; sputter deposition; sputtered coatings; steel; surface alloying; surface morphology; titanium compounds; PVD techniques; TiAlN; XC48 steel substrates; aerated NaCl aqueous solution; chemically inert coatings; corrosion behaviors; corrosion protection; corrosion resistance; electrochemical impedance spectroscopy; electrochemical tests; lowest corrosion current density; material surface; microstructure; optical microscopy; potentiodynamic polarisation test; protective coating; reactive RF magnetron sputtering TiAlN alloying; structure morphology; temperature 293 K to 298 K; thermally stable coatings; transition metal nitride based hard coatings; working properties; Coatings; Corrosion; Resistance; Sputtering; Steel; Substrates; Corrosion behavior; TiAlN; XC48 steel; coatings; magnetron sputtering;
Conference_Titel :
Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS), 2014 IEEE 41st International Conference on
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4799-2711-1
DOI :
10.1109/PLASMA.2014.7012398
