• DocumentCode
    2275474
  • Title

    Fabrication of doped SrZrO3 thin films by Liquid Delivery MOCVD

  • Author

    Kawamura, Hiroshi ; Ohkita, Shuichi ; Uchiyama, Kiyoshi ; Shiosaki, T.

  • Author_Institution
    Nara Inst. of Sci. & Technol., Ikoma
  • fYear
    2007
  • fDate
    27-31 May 2007
  • Firstpage
    108
  • Lastpage
    109
  • Abstract
    The thin film deposition of proton conductive SrZrO3 (SZO) was demonstrated by liquid delivery Metal-Organic Chemical Vapor Deposition (MOCVD). The deposition conditions, especially oxygen flow, affected a film quality of the SZO thin films as well as deposition temperatures. We consider the materials engineering of impurity doping using this deposition technique will improve the proton conductivity of the SZO films for future fuel cell applications.
  • Keywords
    MOCVD; doping; fuel cells; strontium compounds; thin films; SrZrO3; deposition temperatures; film quality; fuel cell; impurity doping; liquid delivery MOCVD; oxygen flow; proton conductivity; thin film deposition; Chemical vapor deposition; Conducting materials; Conductive films; Doping; Fabrication; Impurities; MOCVD; Protons; Sputtering; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Ferroelectrics, 2007. ISAF 2007. Sixteenth IEEE International Symposium on
  • Conference_Location
    Nara
  • ISSN
    1099-4734
  • Print_ISBN
    978-1-4244-1334-8
  • Electronic_ISBN
    1099-4734
  • Type

    conf

  • DOI
    10.1109/ISAF.2007.4393183
  • Filename
    4393183
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2275474