DocumentCode :
2275474
Title :
Fabrication of doped SrZrO3 thin films by Liquid Delivery MOCVD
Author :
Kawamura, Hiroshi ; Ohkita, Shuichi ; Uchiyama, Kiyoshi ; Shiosaki, T.
Author_Institution :
Nara Inst. of Sci. & Technol., Ikoma
fYear :
2007
fDate :
27-31 May 2007
Firstpage :
108
Lastpage :
109
Abstract :
The thin film deposition of proton conductive SrZrO3 (SZO) was demonstrated by liquid delivery Metal-Organic Chemical Vapor Deposition (MOCVD). The deposition conditions, especially oxygen flow, affected a film quality of the SZO thin films as well as deposition temperatures. We consider the materials engineering of impurity doping using this deposition technique will improve the proton conductivity of the SZO films for future fuel cell applications.
Keywords :
MOCVD; doping; fuel cells; strontium compounds; thin films; SrZrO3; deposition temperatures; film quality; fuel cell; impurity doping; liquid delivery MOCVD; oxygen flow; proton conductivity; thin film deposition; Chemical vapor deposition; Conducting materials; Conductive films; Doping; Fabrication; Impurities; MOCVD; Protons; Sputtering; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Applications of Ferroelectrics, 2007. ISAF 2007. Sixteenth IEEE International Symposium on
Conference_Location :
Nara
ISSN :
1099-4734
Print_ISBN :
978-1-4244-1334-8
Electronic_ISBN :
1099-4734
Type :
conf
DOI :
10.1109/ISAF.2007.4393183
Filename :
4393183
Link To Document :
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