• DocumentCode
    2275607
  • Title

    Sol-Gel Derived (Bi,La)4Ti3O12 Thin Films with Surface Treatment before Crystallization Annealing

  • Author

    Tokumitsu, E. ; Sugita, N. ; Boku, S. ; Aoki, T. ; Tani, T.

  • Author_Institution
    Tokyo Inst. of Technol., Yokohama
  • fYear
    2007
  • fDate
    27-31 May 2007
  • Firstpage
    122
  • Lastpage
    125
  • Abstract
    Ferroelectric (Bi,La)4Ti3O12 films have been fabricated by the sol-gel process with "surface treatment" which is carried out before the crystallization annealing. Two kinds of surface treatment have been examined; one is plasma treatment and the other is deposition of thin Bi4Ti3O12, (Bi,Pr)4Ti3O12, or (Bi,Nd)4Ti3O12 layer. It is demonstrated that the growth of c-axis oriented crystallite of BLT films can be suppressed by such treatments and that the remanent polarization of BLT films is larger than that of the BLT film without such surface treatments. In addition, a possible growth mechanism is discussed.
  • Keywords
    bismuth compounds; crystallisation; dielectric hysteresis; ferroelectric thin films; plasma materials processing; recrystallisation annealing; sol-gel processing; surface treatment; (BiLa)4Ti3O12; (BiNd)4Ti3O12; (BiPr)4Ti3O12; BLT films; Bi4Ti3O12; c-axis oriented crystallite; crystallization annealing; ferroelectric thin films; growth mechanism; plasma treatment; remanent polarization; sol-gel processing; surface treatment; thin layer deposition; Annealing; Crystallization; Ferroelectric films; Ferroelectric materials; Plasma simulation; Plasma temperature; Plasma x-ray sources; Polarization; Surface treatment; X-ray scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Ferroelectrics, 2007. ISAF 2007. Sixteenth IEEE International Symposium on
  • Conference_Location
    Nara
  • ISSN
    1099-4734
  • Print_ISBN
    978-1-4244-1334-8
  • Electronic_ISBN
    1099-4734
  • Type

    conf

  • DOI
    10.1109/ISAF.2007.4393189
  • Filename
    4393189