DocumentCode
2275607
Title
Sol-Gel Derived (Bi,La)4 Ti3 O12 Thin Films with Surface Treatment before Crystallization Annealing
Author
Tokumitsu, E. ; Sugita, N. ; Boku, S. ; Aoki, T. ; Tani, T.
Author_Institution
Tokyo Inst. of Technol., Yokohama
fYear
2007
fDate
27-31 May 2007
Firstpage
122
Lastpage
125
Abstract
Ferroelectric (Bi,La)4Ti3O12 films have been fabricated by the sol-gel process with "surface treatment" which is carried out before the crystallization annealing. Two kinds of surface treatment have been examined; one is plasma treatment and the other is deposition of thin Bi4Ti3O12, (Bi,Pr)4Ti3O12, or (Bi,Nd)4Ti3O12 layer. It is demonstrated that the growth of c-axis oriented crystallite of BLT films can be suppressed by such treatments and that the remanent polarization of BLT films is larger than that of the BLT film without such surface treatments. In addition, a possible growth mechanism is discussed.
Keywords
bismuth compounds; crystallisation; dielectric hysteresis; ferroelectric thin films; plasma materials processing; recrystallisation annealing; sol-gel processing; surface treatment; (BiLa)4Ti3O12; (BiNd)4Ti3O12; (BiPr)4Ti3O12; BLT films; Bi4Ti3O12; c-axis oriented crystallite; crystallization annealing; ferroelectric thin films; growth mechanism; plasma treatment; remanent polarization; sol-gel processing; surface treatment; thin layer deposition; Annealing; Crystallization; Ferroelectric films; Ferroelectric materials; Plasma simulation; Plasma temperature; Plasma x-ray sources; Polarization; Surface treatment; X-ray scattering;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Ferroelectrics, 2007. ISAF 2007. Sixteenth IEEE International Symposium on
Conference_Location
Nara
ISSN
1099-4734
Print_ISBN
978-1-4244-1334-8
Electronic_ISBN
1099-4734
Type
conf
DOI
10.1109/ISAF.2007.4393189
Filename
4393189
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