DocumentCode
2275754
Title
Optimizing product yield using manufacturing defect weights
Author
Bickford, Jeanne Paulette ; Hibbeler, Jason D. ; Mueller, Dirk ; Peyer, Sven ; Kumar, Vasanth S.
Author_Institution
IBM Corp. Syst. & Technol. Group, Essex Junction, VT, USA
fYear
2012
fDate
15-17 May 2012
Firstpage
16
Lastpage
20
Abstract
Yield of 45nm products can be optimized by adjusting how the router is run. While forcing wiring to upper levels adds wire length and increases the number of vias, sensitivity to random defects is reduced. Wire spreading does not improve yield for 45nm products.
Keywords
integrated circuit yield; network routing; wires (electric); wiring; manufacturing defect weight; product yield optimization; router; size 45 nm; wiring; Metals; Optimization; Product design; Routing; Sensitivity; Wires; Wiring; Design for Manufacturing (DfM); Manufacturability; Routing; Yield;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference (ASMC), 2012 23rd Annual SEMI
Conference_Location
Saratoga Springs, NY
ISSN
1078-8743
Print_ISBN
978-1-4673-0350-7
Type
conf
DOI
10.1109/ASMC.2012.6212861
Filename
6212861
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