DocumentCode :
2275820
Title :
Potentials of condition based monitoring in semiconductor manufacturing
Author :
Cholette, Michael E. ; Djurdjanovic, Dragan ; Rasberry, John D.
Author_Institution :
Dept. of Mech. Eng., Univ. of Texas at Austin, Austin, TX, USA
fYear :
2012
fDate :
15-17 May 2012
Firstpage :
39
Lastpage :
44
Abstract :
Today, the majority of semiconductor fabrication plants (Fabs) conduct equipment preventive maintenance based on statistically derived time-based or wafer count based intervals. While these practices have had relative success in managing equipment availability and managing product yield, the costs, both in time and materials remains high. Condition Based Monitoring (CBM) has been successfully adopted in several industries, where costs associated with equipment downtime range from loss of life to unacceptable affects to companies´ bottom line. In this paper, we will investigate a method of CBM to semiconductor manufacturing that addresses some of the issues of CBM in complex systems with multiple operating regimes.
Keywords :
condition monitoring; preventive maintenance; semiconductor industry; condition based monitoring; equipment preventive maintenance; semiconductor fabrication plants; semiconductor manufacturing; time-based intervals; wafer count based intervals; Degradation; Hidden Markov models; Maintenance engineering; Manufacturing; Monitoring; Sensor phenomena and characterization; Condition-Based Monitoring; Preventive Maintenance; Semiconductor Manufacturing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference (ASMC), 2012 23rd Annual SEMI
Conference_Location :
Saratoga Springs, NY
ISSN :
1078-8743
Print_ISBN :
978-1-4673-0350-7
Type :
conf
DOI :
10.1109/ASMC.2012.6212865
Filename :
6212865
Link To Document :
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