• DocumentCode
    2275820
  • Title

    Potentials of condition based monitoring in semiconductor manufacturing

  • Author

    Cholette, Michael E. ; Djurdjanovic, Dragan ; Rasberry, John D.

  • Author_Institution
    Dept. of Mech. Eng., Univ. of Texas at Austin, Austin, TX, USA
  • fYear
    2012
  • fDate
    15-17 May 2012
  • Firstpage
    39
  • Lastpage
    44
  • Abstract
    Today, the majority of semiconductor fabrication plants (Fabs) conduct equipment preventive maintenance based on statistically derived time-based or wafer count based intervals. While these practices have had relative success in managing equipment availability and managing product yield, the costs, both in time and materials remains high. Condition Based Monitoring (CBM) has been successfully adopted in several industries, where costs associated with equipment downtime range from loss of life to unacceptable affects to companies´ bottom line. In this paper, we will investigate a method of CBM to semiconductor manufacturing that addresses some of the issues of CBM in complex systems with multiple operating regimes.
  • Keywords
    condition monitoring; preventive maintenance; semiconductor industry; condition based monitoring; equipment preventive maintenance; semiconductor fabrication plants; semiconductor manufacturing; time-based intervals; wafer count based intervals; Degradation; Hidden Markov models; Maintenance engineering; Manufacturing; Monitoring; Sensor phenomena and characterization; Condition-Based Monitoring; Preventive Maintenance; Semiconductor Manufacturing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference (ASMC), 2012 23rd Annual SEMI
  • Conference_Location
    Saratoga Springs, NY
  • ISSN
    1078-8743
  • Print_ISBN
    978-1-4673-0350-7
  • Type

    conf

  • DOI
    10.1109/ASMC.2012.6212865
  • Filename
    6212865