DocumentCode
2275820
Title
Potentials of condition based monitoring in semiconductor manufacturing
Author
Cholette, Michael E. ; Djurdjanovic, Dragan ; Rasberry, John D.
Author_Institution
Dept. of Mech. Eng., Univ. of Texas at Austin, Austin, TX, USA
fYear
2012
fDate
15-17 May 2012
Firstpage
39
Lastpage
44
Abstract
Today, the majority of semiconductor fabrication plants (Fabs) conduct equipment preventive maintenance based on statistically derived time-based or wafer count based intervals. While these practices have had relative success in managing equipment availability and managing product yield, the costs, both in time and materials remains high. Condition Based Monitoring (CBM) has been successfully adopted in several industries, where costs associated with equipment downtime range from loss of life to unacceptable affects to companies´ bottom line. In this paper, we will investigate a method of CBM to semiconductor manufacturing that addresses some of the issues of CBM in complex systems with multiple operating regimes.
Keywords
condition monitoring; preventive maintenance; semiconductor industry; condition based monitoring; equipment preventive maintenance; semiconductor fabrication plants; semiconductor manufacturing; time-based intervals; wafer count based intervals; Degradation; Hidden Markov models; Maintenance engineering; Manufacturing; Monitoring; Sensor phenomena and characterization; Condition-Based Monitoring; Preventive Maintenance; Semiconductor Manufacturing;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference (ASMC), 2012 23rd Annual SEMI
Conference_Location
Saratoga Springs, NY
ISSN
1078-8743
Print_ISBN
978-1-4673-0350-7
Type
conf
DOI
10.1109/ASMC.2012.6212865
Filename
6212865
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