DocumentCode :
227583
Title :
The atmospheric plasma of the ground during the doping process trend analysis study on the current pass
Author :
Sang Hun Kim ; Myoung Soo Yun ; Tae Hoon Jo ; Jong In Park ; Hye Jin Park ; Guangsup Cho ; Eunha Choi ; Gi-Chung Kwon
Author_Institution :
Dept. of Electrophys., Kwangwoon Univ., Seoul, South Korea
fYear :
2014
fDate :
25-29 May 2014
Firstpage :
1
Lastpage :
1
Abstract :
Recently, the wavelength of the ultraviolet region examined laser light by a photochemical reaction, while dopant decomposition of impurities by dissolving the examined part by laser doping technique for applying the method is being developed. However, the laser technique and an ion doping process is too expensive and complicated equipment is required for mass production and the profitability of thin films by ion implantation, and ineffective for the treatment of damage to the subsequent post-annealing is required to have the weakness that the thermal diffusion doping methods are quantitative doping amount of production compared to the control is difficult and time limits.
Keywords :
annealing; decomposition; dissolving; doping; ion implantation; photochemistry; thermal diffusion; thin films; atmospheric plasma; dissolving; dopant decomposition; doping process trend analysis; impurities; ion doping; ion implantation; laser doping; photochemical reaction; subsequent post-annealing; thermal diffusion; thin films; Discharges (electric); Doping; Lasers; Mass production; Plasmas; Process control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS), 2014 IEEE 41st International Conference on
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4799-2711-1
Type :
conf
DOI :
10.1109/PLASMA.2014.7012433
Filename :
7012433
Link To Document :
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