DocumentCode
227583
Title
The atmospheric plasma of the ground during the doping process trend analysis study on the current pass
Author
Sang Hun Kim ; Myoung Soo Yun ; Tae Hoon Jo ; Jong In Park ; Hye Jin Park ; Guangsup Cho ; Eunha Choi ; Gi-Chung Kwon
Author_Institution
Dept. of Electrophys., Kwangwoon Univ., Seoul, South Korea
fYear
2014
fDate
25-29 May 2014
Firstpage
1
Lastpage
1
Abstract
Recently, the wavelength of the ultraviolet region examined laser light by a photochemical reaction, while dopant decomposition of impurities by dissolving the examined part by laser doping technique for applying the method is being developed. However, the laser technique and an ion doping process is too expensive and complicated equipment is required for mass production and the profitability of thin films by ion implantation, and ineffective for the treatment of damage to the subsequent post-annealing is required to have the weakness that the thermal diffusion doping methods are quantitative doping amount of production compared to the control is difficult and time limits.
Keywords
annealing; decomposition; dissolving; doping; ion implantation; photochemistry; thermal diffusion; thin films; atmospheric plasma; dissolving; dopant decomposition; doping process trend analysis; impurities; ion doping; ion implantation; laser doping; photochemical reaction; subsequent post-annealing; thermal diffusion; thin films; Discharges (electric); Doping; Lasers; Mass production; Plasmas; Process control;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS), 2014 IEEE 41st International Conference on
Conference_Location
Washington, DC
Print_ISBN
978-1-4799-2711-1
Type
conf
DOI
10.1109/PLASMA.2014.7012433
Filename
7012433
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