• DocumentCode
    2276367
  • Title

    Measuring hydrochloric acid and ammonium hydroxide permeation in bulk chemical distribution

  • Author

    Moon, Sung In ; Caulfield, Mark ; Extrand, C.W.

  • Author_Institution
    Entegris, Inc., Chaska, MN, USA
  • fYear
    2012
  • fDate
    15-17 May 2012
  • Firstpage
    181
  • Lastpage
    186
  • Abstract
    Permeability (P) and diffusion (D) coefficients were measured for hydrogen chloride and ammonia gas through a tetrafluoroethylene - perfluoroalkoxy (PFA) copolymer using standard manometric techniques. These data were subsequently used to estimate the performance characteristics, such as breakthrough times and permeation rates, of a representative chemical distribution system that may be found inside a semiconductor wafer fabrication facility. Our findings suggest that breakthrough occurs in a matter of days and that steady state permeation can account for the loss of several grams of hydrogen chloride or ammonia each day. This loss rate for hydrogen chloride would be equivalent to spilling five milliliters of concentrated hydrochloric acid on to the floor of a fab each day, or more likely into the secondary containment subsystem, and allowing the acid to dissipate over the course of a day. This equates to two liters per year. Everything else being equal, the loss rate of ammonium hydroxide is expected to be more than two times that of hydrochloric acid. To prevent accumulation of hydrogen chloride or ammonia, the secondary containment subsystem must be purged. The necessary purge rate can be estimated using the mass transport data from this study.
  • Keywords
    chemical analysis; chemical variables measurement; diffusion; permeability; polymer blends; semiconductor technology; HCl; NH4OH; PFA copolymer; ammonia gas; ammonium hydroxide permeation; bulk chemical distribution; chemical distribution system; diffusion coefficients; hydrochloric acid measurement; hydrogen chloride gas; mass transport data; permeability coefficients; secondary containment subsystem; semiconductor wafer fabrication facility; standard manometric techniques; steady state permeation; tetrafluoroethylene perfluoroalkoxy copolymer; Chemicals; Electron tubes; Permeability; Standards; Steady-state; Temperature measurement; Valves; PFA; ammonium hydroxide; chemical distribution; hydrochloric acid; permeation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference (ASMC), 2012 23rd Annual SEMI
  • Conference_Location
    Saratoga Springs, NY
  • ISSN
    1078-8743
  • Print_ISBN
    978-1-4673-0350-7
  • Type

    conf

  • DOI
    10.1109/ASMC.2012.6212885
  • Filename
    6212885