Micro- and nanomachined optics

Author

Kley, Ernst-Bernhard

Author_Institution

Inst. of Appl. Phys., Friedrich-Schiller-Univ., Jena, Germany

fYear

2002

fDate

24-24 May 2002

Abstract

Summary form only given. The tutorial gives an overview of the technologies (with an accent on lithography) that are suitable for the fabrication of micro- and nanostructured optics. Topics covered include: continuous profiles, multilevel profiles, binary patterns, high aspect ratio patterns, photo- and e-beam lithography, laser writing, analogue lithography (gray tone, half tone), dry etching, proportional etching, diamond turning and replication.

Keywords

electron beam lithography; micro-optics; micromachining; nanotechnology; optical fabrication; photolithography; replica techniques; sputter etching; analogue lithography; binary patterns; continuous profiles; diamond turning; dry etching; e-beam lithography; fabrication techniques; gray tone lithography; half tone lithography; high aspect ratio patterns; laser writing; micro-optical elements; micromachining; microstructured optics; multilevel profiles; nanomachining; nanostructured optics; photolithography; proportional etching; replication; Biomedical optical imaging; Bleaching; Glass; Laser mode locking; Lithography; Nanobioscience; Nonlinear optics; Optical pumping; Pump lasers; Quantum dot lasers;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics, 2002. CLEO '02. Technical Digest. Summaries of Papers Presented at the

Conference_Location

Long Beach, CA, USA

Print_ISBN

1-55752-706-7

Type

conf

DOI

10.1109/CLEO.2002.1034414

Filename

1034414