DocumentCode
2276549
Title
Stabilization study of resistive thin films for ac resistors application
Author
Morilhat, A. ; Bounouh, A. ; Lapostolle, F. ; Billard, A. ; Ziade, F. ; Leprat, D.
Author_Institution
LNE, Trappes
fYear
2008
fDate
8-13 June 2008
Firstpage
114
Lastpage
115
Abstract
This paper presents results on the development of metallic ultra thin films on cylindrical alumina substrate, which are the basis of coaxial ac resistors. Ni80Cr20 and Ni75Cr20Al2.5Cu2.5 materials alloy have been used for synthesizing the resistive layers by magnetron sputtering technique. Resistance values as high as 100 k Omega and 200 k Omega have been obtained for both materials respectively over the short substrate length of 45 mm. The characteristics of the layers as homogeneity, thickness, resistances values and stability have been determined and discussed according to the deposit conditions. Specific heat treatments are developed to improve load-life stability of the films.
Keywords
aluminium alloys; chromium alloys; copper alloys; electric resistance; heat treatment; metallic thin films; nickel alloys; sputter deposition; thin film resistors; Ni75Cr20Al2.5Cu2.5; Ni80Cr20; alloy materials; coaxial ac resistors; cylindrical alumina substrate; heat treatments; homogeneity; magnetron sputtering technique; materials stability; materials thickness; metallic ultrathin films; resistances values; resistive layers; Aluminum alloys; Chromium alloys; Coaxial components; Copper alloys; Magnetic materials; Nickel alloys; Resistors; Sputtering; Stability; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Precision Electromagnetic Measurements Digest, 2008. CPEM 2008. Conference on
Conference_Location
Broomfield, CO
Print_ISBN
978-1-4244-2399-6
Electronic_ISBN
978-1-4244-2400-9
Type
conf
DOI
10.1109/CPEM.2008.4574679
Filename
4574679
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