DocumentCode :
2276805
Title :
Characteristics of intersubband absorption at optical communication wavelengths in GaN/AlN multiple quantum wells
Author :
Iizuka, Norio ; Kaneko, Kunihiko ; Suzuki, Nobuhiro
Author_Institution :
Corporate Res. & Dev. Center, Toshiba Corp., Kawasaki, Japan
fYear :
2002
fDate :
24-24 May 2002
Firstpage :
652
Abstract :
Summary form only given. The authors report the intersubband transition at 1.3-1.5 /spl mu/m in a GaN/AlN MQW structure stacked with single quantum wells. By adopting AlN, the highest energy barrier can be achieved for a GaN well, which leads to good carrier confinement at the upper level. They also measured the saturation intensity, which is a necessary parameter for device designs.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; interface states; light absorption; semiconductor quantum wells; semiconductor superlattices; wide band gap semiconductors; 1.3 to 1.5 micron; GaN-AlN; GaN/AlN multiple quantum wells; ISBT; MQW structure; carrier confinement; energy barrier; intersubband absorption; optical communication wavelengths; saturation intensity; single quantum wells; upper level; Absorption; Gallium nitride; Molecular beam epitaxial growth; Optical fiber communication; Optical pulse generation; Pulse amplifiers; Quantum well devices; Semiconductor devices; Stimulated emission; Zinc oxide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2002. CLEO '02. Technical Digest. Summaries of Papers Presented at the
Conference_Location :
Long Beach, CA, USA
Print_ISBN :
1-55752-706-7
Type :
conf
DOI :
10.1109/CLEO.2002.1034439
Filename :
1034439
Link To Document :
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