DocumentCode
227754
Title
Analysis of flow and heat distribution in a 3D stack of chips and memories with back side two-phase cooling
Author
d´Entremont, B.P. ; Marcinichen, Jackson B. ; Thome, John R.
Author_Institution
Lab. of Heat & Mass Transfer (LTCM), Ecole Polytech. Fed. de Lausanne (EPFL), Lausanne, Switzerland
fYear
2014
fDate
27-30 May 2014
Firstpage
193
Lastpage
198
Abstract
Three-dimensional integration of multiple stacked silicon dies using Through-Silicon Vias has been recognized as a likely future direction of integrated circuit design. Yet, in contrast to previous architectures such 3D-ICs require extensive attention to thermal management from the moment of conception. Although such stacks are often associated with integrated, interlayer cooling solutions, it is conceivable that a single microchannel evaporator might provide a simpler cooling solution to support a stack of modest size, especially if made from dies of 50-μm thickness, that are now feasible to manufacture. The current study explores such a solution for a stack of 6 layers, focusing on the interaction of hot spot placement among the layers with the two-phase cooling and flow distribution among the channels of the micro-evaporator. The simulation code is based on numerous methods proven experimentally to work well for the present small size of channels and fluid. The study suggests that such configurations are feasible, yet require careful consideration of the effect of hot spot placement to yield good micro-evaporator performance and safe cooling of the electrical components.
Keywords
cooling; integrated circuit packaging; microchannel flow; temperature distribution; thermal management (packaging); three-dimensional integrated circuits; 3D ICs; 3D chip stack; back side two-phase cooling; electrical component cooling; heat distribution; hot spot placement; integrated circuit design; interlayer cooling solutions; micro-evaporator performance; microchannel evaporator; multiple stacked silicon dies; simulation code; size 50 mum; thermal management; three-dimensional integration; through-silicon vias; Cooling; Fluids; Heat transfer; Heating; Junctions; Microchannels; Silicon; 3D conduction; Microchannel; Through-Silicon Vias (TSVs); hot spot; integrated cooling; microevaporator; parallel flow;
fLanguage
English
Publisher
ieee
Conference_Titel
Thermal and Thermomechanical Phenomena in Electronic Systems (ITherm), 2014 IEEE Intersociety Conference on
Conference_Location
Orlando, FL
ISSN
1087-9870
Type
conf
DOI
10.1109/ITHERM.2014.6892281
Filename
6892281
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