DocumentCode
2277618
Title
Development of Multilayered SrTiO3 Thin-Film Capacitors For Embedded Passive Applications
Author
Wang, Shuqiang ; Hattori, Atsunori ; Ozeki, Yasuyuki ; Ogawa, Hirotaka
Author_Institution
Noda Screen Co., Ltd., Komaki
fYear
2007
fDate
27-31 May 2007
Firstpage
484
Lastpage
486
Abstract
Multilayered thin-film capacitors (MLTFC) with SrTiO3 (STO) dielectric and Pt electrode thin layers were fabricated on polycrystalline alumina substrates, in which amorphous STO dielectric thin layers with thicknesses of 100-300 nm were formed using a cost-effective aerosol chemical vapor deposition (ASCVD) method. The MLTFC with up to ten-layer dielectric layers and total thickness of 0.2-0.25 mm, reached capacitance densities of 100-900 nF/cm2. Further increase in capacitance density of the MLTFC was tried by reduction in thickness and crystallization of STO dielectric thin layers. Three forms of MLTFC (chips, sheets and substrates) are being developed for embedded passive applications.
Keywords
aerosols; chemical vapour deposition; crystallisation; dielectric thin films; electrodes; multilayers; platinum; strontium compounds; thin film capacitors; ASCVD method; Al2O3; SrTiO3-Pt; aerosol chemical vapor deposition; capacitance density; crystallization; dielectric thin layers; electrode; multilayered thin-film capacitors; polycrystalline alumina substrates; size 100 nm to 300 nm; Aerosols; Amorphous materials; Capacitance; Capacitors; Chemical vapor deposition; Crystallization; Dielectric substrates; Dielectric thin films; Electrodes; Sputtering;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Ferroelectrics, 2007. ISAF 2007. Sixteenth IEEE International Symposium on
Conference_Location
Nara
ISSN
1099-4734
Print_ISBN
978-1-4244-1334-8
Electronic_ISBN
1099-4734
Type
conf
DOI
10.1109/ISAF.2007.4393306
Filename
4393306
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