DocumentCode :
2277618
Title :
Development of Multilayered SrTiO3 Thin-Film Capacitors For Embedded Passive Applications
Author :
Wang, Shuqiang ; Hattori, Atsunori ; Ozeki, Yasuyuki ; Ogawa, Hirotaka
Author_Institution :
Noda Screen Co., Ltd., Komaki
fYear :
2007
fDate :
27-31 May 2007
Firstpage :
484
Lastpage :
486
Abstract :
Multilayered thin-film capacitors (MLTFC) with SrTiO3 (STO) dielectric and Pt electrode thin layers were fabricated on polycrystalline alumina substrates, in which amorphous STO dielectric thin layers with thicknesses of 100-300 nm were formed using a cost-effective aerosol chemical vapor deposition (ASCVD) method. The MLTFC with up to ten-layer dielectric layers and total thickness of 0.2-0.25 mm, reached capacitance densities of 100-900 nF/cm2. Further increase in capacitance density of the MLTFC was tried by reduction in thickness and crystallization of STO dielectric thin layers. Three forms of MLTFC (chips, sheets and substrates) are being developed for embedded passive applications.
Keywords :
aerosols; chemical vapour deposition; crystallisation; dielectric thin films; electrodes; multilayers; platinum; strontium compounds; thin film capacitors; ASCVD method; Al2O3; SrTiO3-Pt; aerosol chemical vapor deposition; capacitance density; crystallization; dielectric thin layers; electrode; multilayered thin-film capacitors; polycrystalline alumina substrates; size 100 nm to 300 nm; Aerosols; Amorphous materials; Capacitance; Capacitors; Chemical vapor deposition; Crystallization; Dielectric substrates; Dielectric thin films; Electrodes; Sputtering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Applications of Ferroelectrics, 2007. ISAF 2007. Sixteenth IEEE International Symposium on
Conference_Location :
Nara
ISSN :
1099-4734
Print_ISBN :
978-1-4244-1334-8
Electronic_ISBN :
1099-4734
Type :
conf
DOI :
10.1109/ISAF.2007.4393306
Filename :
4393306
Link To Document :
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