• DocumentCode
    2277618
  • Title

    Development of Multilayered SrTiO3 Thin-Film Capacitors For Embedded Passive Applications

  • Author

    Wang, Shuqiang ; Hattori, Atsunori ; Ozeki, Yasuyuki ; Ogawa, Hirotaka

  • Author_Institution
    Noda Screen Co., Ltd., Komaki
  • fYear
    2007
  • fDate
    27-31 May 2007
  • Firstpage
    484
  • Lastpage
    486
  • Abstract
    Multilayered thin-film capacitors (MLTFC) with SrTiO3 (STO) dielectric and Pt electrode thin layers were fabricated on polycrystalline alumina substrates, in which amorphous STO dielectric thin layers with thicknesses of 100-300 nm were formed using a cost-effective aerosol chemical vapor deposition (ASCVD) method. The MLTFC with up to ten-layer dielectric layers and total thickness of 0.2-0.25 mm, reached capacitance densities of 100-900 nF/cm2. Further increase in capacitance density of the MLTFC was tried by reduction in thickness and crystallization of STO dielectric thin layers. Three forms of MLTFC (chips, sheets and substrates) are being developed for embedded passive applications.
  • Keywords
    aerosols; chemical vapour deposition; crystallisation; dielectric thin films; electrodes; multilayers; platinum; strontium compounds; thin film capacitors; ASCVD method; Al2O3; SrTiO3-Pt; aerosol chemical vapor deposition; capacitance density; crystallization; dielectric thin layers; electrode; multilayered thin-film capacitors; polycrystalline alumina substrates; size 100 nm to 300 nm; Aerosols; Amorphous materials; Capacitance; Capacitors; Chemical vapor deposition; Crystallization; Dielectric substrates; Dielectric thin films; Electrodes; Sputtering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Ferroelectrics, 2007. ISAF 2007. Sixteenth IEEE International Symposium on
  • Conference_Location
    Nara
  • ISSN
    1099-4734
  • Print_ISBN
    978-1-4244-1334-8
  • Electronic_ISBN
    1099-4734
  • Type

    conf

  • DOI
    10.1109/ISAF.2007.4393306
  • Filename
    4393306