• DocumentCode
    2278339
  • Title

    Probe detection of time-varying electron tails

  • Author

    Blackwell, D.D. ; Chen, F.F.

  • Author_Institution
    Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA
  • fYear
    1995
  • fDate
    5-8 June 1995
  • Firstpage
    165
  • Abstract
    Summary form only given, as follows. Acceleration of electrons by wave-particle interactions has been proposed as an ionization mechanism in helicon wave plasma sources, and a number of authors have shown distribution functions with a fast electron tail. Using a carefully RF-compensated Langmuir probe, we have reported the absence of such fast electrons. We find that the discrepancy lies in the delicate nature of RF compensation and in the time variation of the fast electrons, which appear only in the acceleration phase of the RF cycle. When the probe is made to follow RF fluctuations in the floating potential (by use of an auxiliary electrode), the electron tail cannot be seen on the time-averaged I-V trace because the floating potential itself shifts whenever the tail is present. On the other hand, if the probe is inadequately RF-compensated, the tail is masked by the apparent tail that is seen in the de average in the presence of RF. These effects are shown in I-V curves computed with model distribution functions. A properly designed probe should follow the fluctuations in space potential, not floating potential.
  • Keywords
    Langmuir probes; high-frequency discharges; plasma diagnostics; plasma production; RF compensation; RF cycle; RF fluctuations; RF-compensated Langmuir probe; acceleration phase; distribution functions; fast electron tail; floating potential; helicon wave plasma sources; ionization mechanism; probe detection; time variation; time-averaged I-V trace; time-varying electron tails; wave-particle interactions; Acceleration; Distribution functions; Electrons; Fluctuations; Ionization; Plasma sources; Probability distribution; Probes; Radio frequency; Tail;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
  • Conference_Location
    Madison, WI, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-2669-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1995.531629
  • Filename
    531629