DocumentCode
2278339
Title
Probe detection of time-varying electron tails
Author
Blackwell, D.D. ; Chen, F.F.
Author_Institution
Dept. of Electr. Eng., California Univ., Los Angeles, CA, USA
fYear
1995
fDate
5-8 June 1995
Firstpage
165
Abstract
Summary form only given, as follows. Acceleration of electrons by wave-particle interactions has been proposed as an ionization mechanism in helicon wave plasma sources, and a number of authors have shown distribution functions with a fast electron tail. Using a carefully RF-compensated Langmuir probe, we have reported the absence of such fast electrons. We find that the discrepancy lies in the delicate nature of RF compensation and in the time variation of the fast electrons, which appear only in the acceleration phase of the RF cycle. When the probe is made to follow RF fluctuations in the floating potential (by use of an auxiliary electrode), the electron tail cannot be seen on the time-averaged I-V trace because the floating potential itself shifts whenever the tail is present. On the other hand, if the probe is inadequately RF-compensated, the tail is masked by the apparent tail that is seen in the de average in the presence of RF. These effects are shown in I-V curves computed with model distribution functions. A properly designed probe should follow the fluctuations in space potential, not floating potential.
Keywords
Langmuir probes; high-frequency discharges; plasma diagnostics; plasma production; RF compensation; RF cycle; RF fluctuations; RF-compensated Langmuir probe; acceleration phase; distribution functions; fast electron tail; floating potential; helicon wave plasma sources; ionization mechanism; probe detection; time variation; time-averaged I-V trace; time-varying electron tails; wave-particle interactions; Acceleration; Distribution functions; Electrons; Fluctuations; Ionization; Plasma sources; Probability distribution; Probes; Radio frequency; Tail;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location
Madison, WI, USA
ISSN
0730-9244
Print_ISBN
0-7803-2669-5
Type
conf
DOI
10.1109/PLASMA.1995.531629
Filename
531629
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