DocumentCode
2278480
Title
Self-consistent single-particle simulation
Author
Bufler, F.M. ; Zechner, C. ; Schenk, A. ; Fichtner, W.
Author_Institution
Inst. fur Integrierte Syst., Eidgenossische Tech. Hochschule, Zurich, Switzerland
fYear
2002
fDate
2002
Firstpage
159
Lastpage
162
Abstract
Self-consistent single-particle Monte Carlo device simulations are presented. Self-consistency is achieved by an iterative coupling-scheme of single-particle frozen-field Monte Carlo simulations with solutions of the nonlinear Poisson equation. As an example a realistic 0.1 μm n-MOSFET obtained from process simulation with maximum doping levels of about 2.5 × 1020 cm-3 is simulated. It is found that the resulting drain current is independent of the length of the time interval per iteration (provided that it is not too small) and independent of the density in the regions not visited by the particles taken either from a drift-diffusion or a hydrodynamic simulation. Therefore the self-consistent single-particle Monte Carlo simulation is an accurate and robust simulation tool for the quasi-ballistic regime in sub 0.1 μm MOSFETs.
Keywords
MOSFET; Monte Carlo methods; Poisson equation; iterative methods; semiconductor device models; 0.1 micron; Monte Carlo device simulation; drain current; drift-diffusion simulation; hydrodynamic simulation; iterative coupling-scheme; n-MOSFET; nonlinear Poisson equation; quasi-ballistic transport regime; self-consistent single-particle simulation; Couplings; Doping; High definition video; Hydrodynamics; MOSFET circuits; Modeling; Monte Carlo methods; Poisson equations; Stability; Systems engineering and theory;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices, 2002. SISPAD 2002. International Conference on
Print_ISBN
4-89114-027-5
Type
conf
DOI
10.1109/SISPAD.2002.1034541
Filename
1034541
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