• DocumentCode
    2278480
  • Title

    Self-consistent single-particle simulation

  • Author

    Bufler, F.M. ; Zechner, C. ; Schenk, A. ; Fichtner, W.

  • Author_Institution
    Inst. fur Integrierte Syst., Eidgenossische Tech. Hochschule, Zurich, Switzerland
  • fYear
    2002
  • fDate
    2002
  • Firstpage
    159
  • Lastpage
    162
  • Abstract
    Self-consistent single-particle Monte Carlo device simulations are presented. Self-consistency is achieved by an iterative coupling-scheme of single-particle frozen-field Monte Carlo simulations with solutions of the nonlinear Poisson equation. As an example a realistic 0.1 μm n-MOSFET obtained from process simulation with maximum doping levels of about 2.5 × 1020 cm-3 is simulated. It is found that the resulting drain current is independent of the length of the time interval per iteration (provided that it is not too small) and independent of the density in the regions not visited by the particles taken either from a drift-diffusion or a hydrodynamic simulation. Therefore the self-consistent single-particle Monte Carlo simulation is an accurate and robust simulation tool for the quasi-ballistic regime in sub 0.1 μm MOSFETs.
  • Keywords
    MOSFET; Monte Carlo methods; Poisson equation; iterative methods; semiconductor device models; 0.1 micron; Monte Carlo device simulation; drain current; drift-diffusion simulation; hydrodynamic simulation; iterative coupling-scheme; n-MOSFET; nonlinear Poisson equation; quasi-ballistic transport regime; self-consistent single-particle simulation; Couplings; Doping; High definition video; Hydrodynamics; MOSFET circuits; Modeling; Monte Carlo methods; Poisson equations; Stability; Systems engineering and theory;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 2002. SISPAD 2002. International Conference on
  • Print_ISBN
    4-89114-027-5
  • Type

    conf

  • DOI
    10.1109/SISPAD.2002.1034541
  • Filename
    1034541