Title :
Far field extrapolation from near field interactions and shielding influence investigations based on a FE-PEEC coupling method
Author :
Aimé, Jérémie ; Tran, Thanh Son ; Clavel, Edith ; Roudet, James ; Lai-Dac, Kien ; Ecrabey, Jacques
Author_Institution :
Grenoble Electr. Eng. Lab., Domaine Univ., St. Martin d´´Heres, France
Abstract :
Considering standards, the main source of far field emitted by power electronic structures is the common mode current generated by the floating potentials tracks. Moreover, due to the frequency and power increases, the compliance to EMC becomes more and more difficult. In consequence, it is necessary to investigate practical solutions to reduce the emitted field. A useful solution is the shielding of wounded components which are near field influent sources. But this solution may be not efficient for far field reduction and investigations concerning component placement can be a better and cheaper solution. A FE-PEEC hybrid method was developed and can be used to investigate near field interactions and shielding influence. The method is applied to a structure combining a common mode filter with the floating potentials of an inverter. Using the hybrid method, the near field interactions and the influence of the common mode inductance shielding are analyzed on the floating potentials which are the sensitive part of the structure.
Keywords :
electromagnetic compatibility; electromagnetic coupling; electromagnetic shielding; equivalent circuits; finite element analysis; invertors; power convertors; power electronics; EMC; FE-PEEC coupling method; Power conversion; common mode filter; electromagnetic compatibility; electromagnetic coupling; far field extrapolation; finite element method; inverter; near field interaction; partial element equivalent circuits; power electronic structures; static converters; Electromagnetic compatibility; Electromagnetic coupling; Modeling; Power conversion;
Conference_Titel :
Energy Conversion Congress and Exposition, 2009. ECCE 2009. IEEE
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4244-2893-9
Electronic_ISBN :
978-1-4244-2893-9
DOI :
10.1109/ECCE.2009.5316298