Experimental and theoretical characterization of the plasma in an ECR reactor

Summary form only given. We have measured the spatial distribution of electron temperature and density, and plasma potential, in a two-magnet ECR reactor that is being used for etching. We report here on characterization of an Ar plasma. Work on Ar/Cl mixtures is beginning at the present time. The principal electron diagnostics at present are Langmuir probes, and a 140 GHz microwave interferometer. A variety of optical diagnostics, including VUV and optical emission spectroscopies, are being employed. The control parameters scanned cover the range of pressure 0.5 to 5 mT, flow rate 2.5 to 30 sccm, microwave input power 100 to 700 W, and a variety of magnetic field profiles. The location and bias of the etching stage has also been varied. We have developed a fast-running quasineutral PIC simulation code (particle ions, particle electrons), which represents the sheaths by means of appropriate potential jump and Bohm flow boundary conditions, and provides spatially resolved plasma densities, temperatures and distribution functions within the bulk plasma. Simulation results and analytic theory will be compared with the experimental results.