DocumentCode :
2279053
Title :
Simulations of ultrathin, ultrashort double-gated MOSFETs with the density gradient transport model
Author :
Lyumkis, E. ; Mickevicius, R. ; Penzin, O. ; Polsky, B. ; El Sayed, K. ; Wettstein, A. ; Fichtner, W.
Author_Institution :
Integrated Syst. Eng. Inc., San Jose, CA, USA
fYear :
2002
fDate :
2002
Firstpage :
271
Lastpage :
274
Abstract :
We report the results of numerical simulation of nanoscale SOI structures under highly non-equilibrium conditions with the Density Gradient model. The simulations have been carried out with the general purpose device simulator DESSIS. We show that 2D quantum mechanical effects are important for the structures under investigation. We demonstrate that our implementation of the DG model is robust and enables efficient simulation far from equilibrium, for both the drift-diffusion and hydrodynamic transport model.
Keywords :
MOSFET; nanotechnology; semiconductor device models; silicon-on-insulator; 2D quantum mechanical effects; density gradient model; drift-diffusion model; highly nonequilibrium conditions; hydrodynamic transport model; nanoscale SOI structures; numerical simulation; ultrashort double-gated MOSFETs; Boundary conditions; Differential equations; FETs; MOSFETs; Modeling; Mutual coupling; Nanostructures; Quantum mechanics; Robustness; Systems engineering and theory;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2002. SISPAD 2002. International Conference on
Print_ISBN :
4-89114-027-5
Type :
conf
DOI :
10.1109/SISPAD.2002.1034570
Filename :
1034570
Link To Document :
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