DocumentCode :
2279171
Title :
Effect of thermal and electromigration exposure on solder joint board level drop reliability
Author :
Xu, Luhua ; Pang, John H L
Author_Institution :
Sch. of Mech. & Aerosp. Eng., Nanyang Technol. Univ.
fYear :
2006
fDate :
6-8 Dec. 2006
Firstpage :
570
Lastpage :
575
Abstract :
The combined sequential reliability test of thermal cycling aging or electromigration test followed by board level drop test for lead-free SnAgCu soldered assemblies were investigated. Interfacial IMCs, Kirkendall voids formation and interconnect failure mode are studied subject to TC aging and combined thermal-electromigration. Kirkendall voids were observed with Ar+ sputtering etching. The failure sites and mechanism were examined and correlated with IMC and void formation. Significant decrease of drop life was observed for both SAC/ENIG and SAC/Cu-OSP assemblies after thermal cycling aging. Growth of Kirkendall voids and IMC significantly weakened the solder joint interface during TC aging. Drop impact crack path changed from the IMC to the IMC/Cu interface
Keywords :
argon; electromigration; printed circuit testing; reliability; solders; sputter etching; thermal management (packaging); tin alloys; voids (solid); Ar; Ar+ sputtering etching; Kirkendall voids formation; SnAgCu; electromigration exposure; electromigration test; interconnect failure mode; interfacial IMC; sequential reliability test; solder joint board level drop reliability; solder joint interface; thermal cycling aging; thermal exposure; thermal-electromigration; Aerospace testing; Aging; Assembly; Circuit testing; Electromigration; Environmentally friendly manufacturing techniques; Integrated circuit interconnections; Lead; Sequential analysis; Soldering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Packaging Technology Conference, 2006. EPTC '06. 8th
Conference_Location :
Singapore
Print_ISBN :
1-4244-0664-1
Electronic_ISBN :
1-4244-0665-X
Type :
conf
DOI :
10.1109/EPTC.2006.342776
Filename :
4147305
Link To Document :
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