Comparatively plasma deposition of PEDOT thin films

PEDOT thin films has been widely using as electrode for variety areas because of its excellent chemical stability, low redox potential and high optical transparency in the doped states. Herein, we report that comparatively deposition of PEDOT thin film through microwave and radio frequency plasma onto ITO/glass substrate. The untreated EDOT monomer was evaporated from the outer reaction glass vessel and the substrate placed into pyrex chamber and computer-controlled plasma treatments were conducted. 2.45 GHz microwave plasma and 13.56 MHz radio frequency plasma radiations were used with continuous powers of 350 W and 50 W, respectively. Standardized experimental parameters were used and optical emission spectra (OES) were taken during the plasma process under vacuum conditions of 0.02 Torr. The deposited films were characterized by Fourier transform infrared (FTIR), Energy-dispersive X-ray Spectroscopy (EDS), Scanning Electron Microscopy (SEM), X-ray diffraction (XRD) and electrical conductivities were measured by four-point probe technique. In this study, a comparison of physical properties of plasma deposited thin films is discussed. It is showed that plasma polymerization of PEDOT resulted as crosslinked structure and electrically conductive up to 10^-5 S/cm.