Title :
Uniform deposition of zirconium dioxide layers by atmospheric-pressure plasma-enhanced chemical vapor deposition
Author :
Jae-Ok Lee ; Woo Seok Kang ; Min Hur ; Young-Hoon Song
Author_Institution :
Korea Inst. of Machinery & Mater., Daejeon, South Korea
Abstract :
Summary form only given. Plasma-enhanced chemical vapor deposition (PECVD) at high pressure has been a challenging topic because of the inhomogeneous plasma instability and lack of process information. Here we report a demonstration of atmospheric-pressure plasma-enhanced CVD (AP-PECVD) for uniform deposition of zirconium dioxide (ZrO2) layers that are widely used in electronics and mechanical applications.
Keywords :
dielectric-barrier discharges; electrodes; heat treatment; plasma CVD; zirconium compounds; AP-PECVD; L-shaped electrodes; ZrO2; atmospheric-pressure plasma-enhanced chemical vapor deposition; dielectric barrier discharge; electrical monitoring; gas exhaust; gas flow stream; gas supply; homogeneous plasmas; linear sweeping motion; liquid precursor; material analysis; optical monitoring; particle formation; plasma reactor; process chamber; substrate heating; substrate stage conditions; tetrakis(ethylmethylamido)zirconium; zirconium dioxide layers; Chemical vapor deposition; Inductors; Machinery; Plasmas; Substrates; Zirconium;
Conference_Titel :
Plasma Sciences (ICOPS) held with 2014 IEEE International Conference on High-Power Particle Beams (BEAMS), 2014 IEEE 41st International Conference on
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4799-2711-1
DOI :
10.1109/PLASMA.2014.7012610
