DocumentCode
2279615
Title
Whisker formation behavior on tin film plated in high magnetic field
Author
Tsutsumi, Keisuke ; Iwane, Yuichi ; Morizono, Yasuhiro ; Kozuka, Toshiyuki ; Ohno, Yasuhide
Author_Institution
Kumamoto Univ.
fYear
2006
fDate
6-8 Dec. 2006
Firstpage
722
Lastpage
725
Abstract
High magnetic field was applied during Sn plating treatment for brass to change crystal orientation in the plating film. After prolonged heat treatment at 323 K, its effect on the formation of Sn whisker was investigated by scanning electron microscopic observations and X-ray diffraction (XRD). The XRD pattern of the film varied with the angle between the substrate and the direction of the magnetic field. When the specimen showed the XRD pattern similar to the film formed without the applied magnetic field, the whiskers were observed after the heat treatment. However, the generation of the whisker could not be confirmed in the case of the film with different XRD pattern. Therefore, it is expected that the plating treatment with the high magnetic field serves for inhibition of the whisker. The cases of Fe-42 mass% Ni alloy substrate were also discussed.
Keywords
X-ray diffraction; crystal growth; heat treatment; magnetic fields; scanning electron microscopy; tin; whiskers (crystal); 323 K; Sn; X-ray diffraction; crystal orientation; heat treatment; magnetic field; plating film; plating treatment; scanning electron microscope; whisker formation behavior; Electrodes; Heat treatment; Magnetic fields; Magnetic films; Scanning electron microscopy; Substrates; Surface morphology; Surface treatment; Tin; X-ray scattering;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics Packaging Technology Conference, 2006. EPTC '06. 8th
Conference_Location
Singapore
Print_ISBN
1-4244-0664-1
Electronic_ISBN
1-4244-0665-X
Type
conf
DOI
10.1109/EPTC.2006.342802
Filename
4147331
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