DocumentCode
2281181
Title
Design and fabrication of MJTCs on quartz substrates at NIST
Author
Scarioni, L. ; Lipe, T.E. ; Kinard, J.R.
Author_Institution
Dept. de Fis., Univ. de Carabobo, Valencia, Venezuela
fYear
2008
fDate
8-13 June 2008
Firstpage
648
Lastpage
649
Abstract
Dry etching is employed in the fabrication of new planar, thin-film multijunction thermal converters (MJTCs) on quartz membranes and crystalline quartz chips at NIST. The use of crystalline quartz as a material for the membrane and for the chip improves the performance of the MJTC in the frequency range from 100 kHz to 100 MHz. Simulations of the ac-dc voltage transfer difference for a heater resistance of 400 Omega in the frequency range from 1 MHz to 100 MHz show a reduction in the ac-dc transfer difference of more than one order of magnitude in comparison with MJTCs fabricated on silicon chips.
Keywords
convertors; etching; membranes; quartz; thermocouples; thin film devices; MJTC; NIST; ac-dc voltage transfer difference; crystalline quartz chips; dry etching; frequency 100 kHz to 100 MHz; quartz membranes; resistance 400 ohm; thin-film multijunction thermal converters; Biomembranes; Crystalline materials; Crystallization; Dry etching; Fabrication; Frequency; NIST; Substrates; Transistors; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Precision Electromagnetic Measurements Digest, 2008. CPEM 2008. Conference on
Conference_Location
Broomfield, CO
Print_ISBN
978-1-4244-2399-6
Electronic_ISBN
978-1-4244-2400-9
Type
conf
DOI
10.1109/CPEM.2008.4574946
Filename
4574946
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