Title :
Static Noise Margin and Power-Gating Efficiency of a New Nonvolatile SRAM Cell Based on Pseudo-Spin-Transistor Architecture
Author :
Shuto, Yusuke ; Yamamoto, Shuu´ichirou ; Sugahara, Satoshi
Author_Institution :
Imaging Sci. & Eng. Lab., Tokyo Inst. of Technol., Yokohama, Japan
Abstract :
Static noise margin (SNM) and power-gating efficiency were computationally analyzed for our proposed nonvolatile SRAM (NV-SRAM) cell based on pseudo-spin-MOSFET (PS-MOSFET) architecture using spin-transfer-torque MTJs (STT-MTJs). The NV-SRAM cell has the same SNM as an optimized 6T-SRAM cell. SNM was also evaluated for other recently-proposed NV-SRAM cells using STT-MTJs, and we showed that their SNMs were deteriorated owing to the effect of the constituent STT-MTJs. Break-even time (BET) and power efficiency were analyzed for the NV-SRAM cell using PS-MOSFETs. The BET can be successfully minimized by controlling the bias of the cell. The average power dissipation can be effectively reduced by power-gating (PG) executions, and the further reduction is made possible by introducing a sleep mode (which is a data retention mode using a low power supply voltage).
Keywords :
MOSFET; SRAM chips; random-access storage; BET; NV-SRAM cell; PG executions; PS-MOSFET architecture; SNM; STT-MTJ; break-even time; data retention mode; nonvolatile SRAM cell; optimized 6T-SRAM cell; power efficiency; power-gating efficiency; power-gating executions; pseudo-spin- MOSFET architecture; pseudo-spin-transistor architecture; spin-transfer-torque MTJ; static noise margin; Computer architecture; Computer integrated manufacturing; Leakage current; MOSFET circuits; Microprocessors; Random access memory; Transistors;
Conference_Titel :
Memory Workshop (IMW), 2012 4th IEEE International
Conference_Location :
Milan
Print_ISBN :
978-1-4673-1079-6
DOI :
10.1109/IMW.2012.6213624