• DocumentCode
    2282249
  • Title

    On the effective mobility for electrons in MOS inversion channels

  • Author

    Biesemans, S. ; De Meyer, K.

  • Author_Institution
    ASP Div., IMEC, Leuven, Belgium
  • fYear
    1997
  • fDate
    8-10 Sept. 1997
  • Firstpage
    165
  • Lastpage
    168
  • Abstract
    The results of this paper are twofold. First, the relation between the local mobility model /spl mu//sub 1/(E/spl I.oarr/) and the long channel measured effective mobility /spl mu//sub eff/(V/sub gs/) is investigated. This allows one to find a mathematical condition which any /spl mu//sub 1/ model in a 2D numerical device simulator should fulfil. Here, we extend our previous work by using this condition to find the model parameters of a MEDICI /spl mu//sub 1/ model. We reach very good quantitative agreement with an experiment for a complete L-array, even for poly lengths down to 0.08 /spl mu/m. Secondly, it is advocated that the long channel effective mobility cannot be used to model short channel devices. We show experimentally and theoretically that the short channel effective mobility depends on the channel length due to the high internal drain-channel built-in field.
  • Keywords
    MOSFET; electron mobility; electronic engineering computing; inversion layers; semiconductor device models; 0.08 micron; 2D numerical device simulator; MEDICI /spl mu//sub 1/ model; MOS inversion channels; effective mobility; local mobility model; long channel devices; model parameters; short channel devices; Electron mobility; Intrusion detection; MOSFET circuits; Mathematical model; Medical simulation; Microscopy; Numerical simulation; Tellurium; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 1997. SISPAD '97., 1997 International Conference on
  • Conference_Location
    Cambridge, MA, USA
  • Print_ISBN
    0-7803-3775-1
  • Type

    conf

  • DOI
    10.1109/SISPAD.1997.621363
  • Filename
    621363