DocumentCode :
2282249
Title :
On the effective mobility for electrons in MOS inversion channels
Author :
Biesemans, S. ; De Meyer, K.
Author_Institution :
ASP Div., IMEC, Leuven, Belgium
fYear :
1997
fDate :
8-10 Sept. 1997
Firstpage :
165
Lastpage :
168
Abstract :
The results of this paper are twofold. First, the relation between the local mobility model /spl mu//sub 1/(E/spl I.oarr/) and the long channel measured effective mobility /spl mu//sub eff/(V/sub gs/) is investigated. This allows one to find a mathematical condition which any /spl mu//sub 1/ model in a 2D numerical device simulator should fulfil. Here, we extend our previous work by using this condition to find the model parameters of a MEDICI /spl mu//sub 1/ model. We reach very good quantitative agreement with an experiment for a complete L-array, even for poly lengths down to 0.08 /spl mu/m. Secondly, it is advocated that the long channel effective mobility cannot be used to model short channel devices. We show experimentally and theoretically that the short channel effective mobility depends on the channel length due to the high internal drain-channel built-in field.
Keywords :
MOSFET; electron mobility; electronic engineering computing; inversion layers; semiconductor device models; 0.08 micron; 2D numerical device simulator; MEDICI /spl mu//sub 1/ model; MOS inversion channels; effective mobility; local mobility model; long channel devices; model parameters; short channel devices; Electron mobility; Intrusion detection; MOSFET circuits; Mathematical model; Medical simulation; Microscopy; Numerical simulation; Tellurium; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 1997. SISPAD '97., 1997 International Conference on
Conference_Location :
Cambridge, MA, USA
Print_ISBN :
0-7803-3775-1
Type :
conf
DOI :
10.1109/SISPAD.1997.621363
Filename :
621363
Link To Document :
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