DocumentCode :
2282328
Title :
An Update on Emerging Memory: Progress to 2Xnm
Author :
Prall, Kirk ; Ramaswamy, Nirmal ; Kinney, Wayne ; Holtzclaw, Karl ; Chen, Xiaonan ; Strand, Jonathan ; Bez, Roberto
Author_Institution :
Micron Technol., Boise, ID, USA
fYear :
2012
fDate :
20-23 May 2012
Firstpage :
1
Lastpage :
5
Abstract :
This paper will give an update on the status of emerging memory (EM) and potential markets. The more popular EM technologies will be reviewed, including PCM, RRAM, and STRAM. The biggest challenges for each technology will be highlighted.
Keywords :
random-access storage; EM technology; PCM; RRAM; STRAM; emerging memory; potential markets; Anisotropic magnetoresistance; Heating; Noise; Phase change materials; Random access memory; Resistance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Memory Workshop (IMW), 2012 4th IEEE International
Conference_Location :
Milan
Print_ISBN :
978-1-4673-1079-6
Type :
conf
DOI :
10.1109/IMW.2012.6213635
Filename :
6213635
Link To Document :
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