DocumentCode :
2282356
Title :
Scaling Challenges in NAND Flash Device toward 10nm Technology
Author :
Lee, Seokkiu
Author_Institution :
R&D, Hynix Semicond. Inc., Icheon, South Korea
fYear :
2012
fDate :
20-23 May 2012
Firstpage :
1
Lastpage :
4
Abstract :
The scaling of floating gate cell has been the key driving force in NAND flash market growth over the past two decades. However, the scaling of conventional floating gate technology below 20nm is looking to be very difficult due to some physical and electrical issues. Critical issues of scaling in NAND flash memory technology below 20nm are reviewed. The possible solutions for overcoming scaling challenges are introduced. With these solutions, floating gate NAND flash cell could be shrunk down close to 10nm dimension.
Keywords :
NAND circuits; flash memories; logic gates; NAND flash device; NAND flash market growth; NAND flash memory technology; conventional floating gate technology; floating gate NAND flash cell; floating gate cell scaling; key driving force; scaling challenges; size 10 nm; Air gaps; Couplings; Flash memory; Interference; Logic gates; Nonvolatile memory; Shape;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Memory Workshop (IMW), 2012 4th IEEE International
Conference_Location :
Milan
Print_ISBN :
978-1-4673-1079-6
Type :
conf
DOI :
10.1109/IMW.2012.6213636
Filename :
6213636
Link To Document :
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