Title :
Novel X-ray sensitive resists for the LiGA-technique
Author :
Hautling, L. H. ; Hoessel, P. ; Hoffmann, G. ; Wuensch, T. ; Koch, Ed ; Hormers, J. ; Wollersheim, O.
Abstract :
Poly-L-Lactides are presented as a new resist material for the LiGA-technique, which is both, more sensitive and free of stress crack formation. The degradation mechanism of Poly-L-Lactides is found to produce carboxylic acid-as well as acrylic ester end groups. Determining the molecular weight of the fragments generated, the G-values can be calculated
Keywords :
Etching; Laboratories; Lithography; Plastics; Polymers; Resists; Solvents; Stress; Synchrotrons; Temperature sensors;
Conference_Titel :
Micro Machine and Human Science, 1994. Proceedings., 1994 5th International Symposium on
Conference_Location :
Nagoya, Japan
Print_ISBN :
0-7803-2095-6
DOI :
10.1109/ISMMHS.1994.512915
