Title :
Optimum repeater insertion to minimize the propagation delay into 32nm RLC interconnect
Author_Institution :
LIRMM, Univ. Montpellier II, Montpellier, France
Abstract :
When high speed integrated digital circuits technology scales down from one node to the other as ITRS recommends, a significant gain is obtained on signal speed, consumption and area of CMOS transistors. Nevertheless a specific issue occurs from the 45 nm technology node. The obtained gain on active devices is foiled by an increase of interconnect propagation delays in the Back-End of Line (BEOL). This issue especially concerns relatively long (few hundred of mm) interconnects of the intermediate metal level. By introducing drivers (repeaters) in order to divide long interconnect in shorter sections and choosing optimal drivers sizes, speed can be maximized. This paper proposes a new optimal buffer sizing, and maximum length to be used for repeater networks, to optimize propagation delay for long interconnect of the 32nm technology, by taking into account, for the first time, the input transition time at each stage.
Keywords :
CMOS integrated circuits; RLC circuits; driver circuits; high-speed integrated circuits; integrated circuit interconnections; repeaters; transistor circuits; BEOL; CMOS transistor; ITRS; RLC interconnect; active device; back-end of line; driver size; high speed integrated digital circuit; interconnect propagation delay minimization; intermediate metal level; optimal buffer sizing; optimum repeater insertion; repeater network; signal speed; size 32 nm; size 45 nm; transition time; Delay; Dielectrics; Integrated circuit interconnections; Metals; Optimization; Propagation delay; Repeaters;
Conference_Titel :
Electrical Design of Advanced Packaging and Systems Symposium (EDAPS), 2011 IEEE
Conference_Location :
Hanzhou
Print_ISBN :
978-1-4673-2288-1
Electronic_ISBN :
2151-1225
DOI :
10.1109/EDAPS.2011.6213729