Title :
Comparative study on the characteristics among few-walled carbon nanotube array field-effect transistors
Author :
Cao, Ying-Qiu ; Yu, Meng-Jie ; Huang, Jun ; Yin, Wen-Yan
Author_Institution :
State Key Lab. of MOI, Zhejiang Univ., Hangzhou, China
Abstract :
Comparative study is performed for characterizing few-walled carbon nanotube field-effect transistors (FWCNTFETs) using the extended compact circuit modeling technique, with their capacitive parasitic effects as well as input-output responses obtained. In particular, screening effects in the FWCNT array, the influences of doping resistances, Schottky-barrier (SB) resistances, and parasitic capacitances are all examined numerically. The performance of triple-walled CNTFET (TWCNTFETs) is compared with single- and double-walled geometries (SWCNTFET & TWCNTFET). It is found that, with respect to DWCNTFET counterpart, the triple-walled geometry has slight improved total current, but longer delay time, lower cutoff frequency, and more complex fabrication technology has to be implemented for its realization.
Keywords :
Schottky barriers; carbon nanotubes; field effect transistors; semiconductor device models; FWCNT array; Schottky-barrier resistances; capacitive parasitic effects; compact circuit modeling technique; complex fabrication technology; cutoff frequency; delay time; doping resistances; double-walled geometries; few-walled carbon nanotube array field-effect transistors; input-output responses; parasitic capacitances; screening effects; single-walled geometries; triple-walled CNTFET; triple-walled geometry; CNTFETs; Cutoff frequency; Delay; Geometry; Numerical models; Semiconductor process modeling; ON current; compact circuit model; cutoff frequency; few-walled carbon nanotube field-effect transistors (FWCNTFET); signal delay;
Conference_Titel :
Electrical Design of Advanced Packaging and Systems Symposium (EDAPS), 2011 IEEE
Conference_Location :
Hanzhou
Print_ISBN :
978-1-4673-2288-1
Electronic_ISBN :
2151-1225
DOI :
10.1109/EDAPS.2011.6213742