DocumentCode :
2284319
Title :
Photoluminescence and photoreflectance scanning of silicon-on-insulator materials
Author :
Hovel, Harold J.
Author_Institution :
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
fYear :
1993
fDate :
5-7 Oct 1993
Firstpage :
26
Lastpage :
27
Abstract :
Photoluminescence (PL) and photoreflectance (PR) intensity maps of silicon-on-insulator (SOI) wafers tend to reveal much more than bare silicon. They are often rich in features due to both reflectance variations arising from the optical properties of the multi-layer stack, and to electrical variations across the wafers. PL scanning of these materials reveals many qualitative features useful in tracking uniformity across the wafer and repeatability between wafers from different fabrication runs
Keywords :
photoluminescence; photoreflectance; reflectivity; semiconductor-insulator boundaries; silicon; SOI wafers; Si; electrical variations; multi-layer stack; optical properties; photoluminescence scanning; photoreflectance scanning; reflectance; repeatability; silicon-on-insulator materials; uniformity; Gallium arsenide; Laser beams; Optical materials; Photoluminescence; Reflectivity; Semiconductor lasers; Semiconductor materials; Silicon on insulator technology; Surface emitting lasers; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, 1993. Proceedings., 1993 IEEE International
Conference_Location :
Palm Springs, CA
Print_ISBN :
0-7803-1346-1
Type :
conf
DOI :
10.1109/SOI.1993.344607
Filename :
344607
Link To Document :
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