DocumentCode
2284374
Title
Design and fabrication of nanoscale antireflection structures with linearly graded refractive index
Author
Song, Young Min ; Jang, Sung Jun ; Choi, Hee Ju ; Yu, Jae Su ; Lee, Yong Tak
Author_Institution
Dept. of Inf. & Commun., Gwangju Inst. of Sci. & Technol., Gwangju, South Korea
fYear
2010
fDate
17-20 Aug. 2010
Firstpage
294
Lastpage
297
Abstract
We demonstrate nanoscale antireflection structures on GaAs substrate with linearly graded effective refractive index using a lenslike shape transfer for broadband light-absorbing device application. From reflectance calculation of cone- and parabola-shaped subwavelength grating (SWG) structures, it is found that the parabola shaped structures has lower mean reflectance compared to that of the cone shaped structures over a wide wavelength range. The fabricated SWG structures with parabola shape show the reflectance of below 5 % in a 300-1200 nm wavelength range.
Keywords
III-V semiconductors; antireflection coatings; diffraction gratings; gallium arsenide; reflectivity; refractive index; GaAs; broadband light-absorbing device; cone-shaped subwavelength grating; lenslike shape transfer; linearly graded refractive index; nanoscale antireflection structures; parabola-shaped subwavelength grating; reflectance;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on
Conference_Location
Seoul
ISSN
1944-9399
Print_ISBN
978-1-4244-7033-4
Electronic_ISBN
1944-9399
Type
conf
DOI
10.1109/NANO.2010.5697755
Filename
5697755
Link To Document