DocumentCode
2284521
Title
High accuracy step-and-repeat uv imprint lithography for wafer level camera master manufacturing
Author
Kreindl, G. ; Glinsner, T. ; Födisch, R. ; Treiblmayr, D. ; Miller, R.
Author_Institution
EVGroup, St. Florian, Austria
fYear
2010
fDate
17-20 Aug. 2010
Firstpage
347
Lastpage
351
Abstract
This work demonstrates unmatched needs for wafer-level camera applications like lateral lens to lens position accuracies of <; ± 200 nm on arbitrary x and y distances as well as optic axes tilt measurements using step and repeat UV-nano imprint lithography.
Keywords
nanolithography; optical fabrication; photographic lenses; soft lithography; ultraviolet lithography; lateral lens-to-lens position; optic axes tilt measurements; step-and-repeat UV imprint lithography; wafer level camera master manufacturing;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on
Conference_Location
Seoul
ISSN
1944-9399
Print_ISBN
978-1-4244-7033-4
Electronic_ISBN
1944-9399
Type
conf
DOI
10.1109/NANO.2010.5697762
Filename
5697762
Link To Document