Ion distribution functions in an inductively coupled plasma

Summary form only given, as follows. In developing plasma processes, it is important to understand the effect of different process parameters on the distribution functions of ions which are incident on a wafer surface. In this work, two dimensional ion distribution functions are calculated using a kinetic model based on the method described in Hitchon et al. (1989). For lower pressure regimes, fluid techniques become inadequate for tracking ions, making a kinetic technique necessary. This kinetic module is but one component of a multimodule hybrid, which also includes modules for calculating electric fields, the electrostatic potential, and the electron energy distribution function (EEDF). The EEDF calculation is based on a non-local approach. A comparison of ion distributions, and how they vary with process parameters such as system geometry, pressure, and coil placement will be presented.