DocumentCode :
2285100
Title :
The effects of dielectric layers on SiC based epitaxial graphene in transistor applications
Author :
Kim, Moonkyung ; Hwang, Jeonghyun ; Shivaraman, Shriram ; Shields, Virgil B. ; Chan, Wei Min ; Thomas, Chris ; Hao, Dong ; Lee, Jo-Won ; Tiwari, Sandip ; Spencer, Michael G.
Author_Institution :
Sch. of Electr. & Comput. Eng., Cornell Univ., New York, NY, USA
fYear :
2010
fDate :
17-20 Aug. 2010
Firstpage :
611
Lastpage :
614
Abstract :
By characterizing the mobility of Si-face/C-face of SiC graphene before and after stacking the layer of HfO2 with a polyvinyl alcohol (PVA) treatment on the device active layer, we have explored the properties of SiC based epitaxial graphene and the effects of the dielectric film with PVA treatment. Epitaxial graphene grown on the carbon face produces a higher mobility than film grown on the silicon face. Also, the mobility, in the presence of the PVA treatment, improves after the deposition of gate dielectrics: ~20% in C-face graphene and ~100% in Si-face graphene. This is unlike the degradation normally observed with dielectric/graphene systems.
Keywords :
carrier mobility; dielectric thin films; epitaxial growth; epitaxial layers; graphene; hafnium compounds; transistors; C; HfO2; PVA treatment; SiC; dielectric film; dielectric layers; epitaxial graphene; gate dielectrics; mobility; polyvinyl alcohol treatment; transistor applications;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on
Conference_Location :
Seoul
ISSN :
1944-9399
Print_ISBN :
978-1-4244-7033-4
Electronic_ISBN :
1944-9399
Type :
conf
DOI :
10.1109/NANO.2010.5697796
Filename :
5697796
Link To Document :
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