Title :
Remeasurement of the (220) lattice spacing of silicon
Author :
Cavagnero, G. ; Durando, G. ; Mana, G. ; Massa, E. ; Zosi, G.
Author_Institution :
Ist. di Metrologia "G. Colonnetti", CNR, Torino, Italy
Abstract :
A need arose for a reduction of the present relative uncertainty in the measurement of the silicon lattice spacing down to 10/sup -9/. This paper describes our advances towards this goal.
Keywords :
X-ray crystallography; constants; electromagnetic wave interferometry; elemental semiconductors; lattice constants; silicon; spatial variables measurement; (220) lattice spacing; Avogadro constant determination; Si; Si crystal; Si lattice spacing; X-ray interferometry; laser interferometry; lattice parameter; measurement uncertainty; Assembly; Atomic measurements; Density measurement; Geometry; Lattices; Measurement standards; Mirrors; Shape; Silicon;
Conference_Titel :
Precision Electromagnetic Measurements, 2002. Conference Digest 2002 Conference on
Conference_Location :
Ottawa, Ontario, Canada
Print_ISBN :
0-7803-7242-5
DOI :
10.1109/CPEM.2002.1034971
