DocumentCode
2285466
Title
Simple fabrication of microfluidic channel with nanoporous membrane formed by conventional physical vapor deposition
Author
Choi, Dong-Hoon ; Lee, Byung-Kee ; Yang, Hyun-Ho ; Yoon, Jun-Bo
Author_Institution
Dept. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
fYear
2010
fDate
17-20 Aug. 2010
Firstpage
740
Lastpage
743
Abstract
In this paper, we first proposed that the thin film deposited by conventional physical vapor deposition can be used as a membrane for molecular filtration because of its columnar grains. The columnar grains of thin membrane were formed naturally during physical vapor deposition and offered nano-sized pores to filter molecules. A microfluidic channel integrated with the membrane was successfully fabricated, and the existence of the nanopores was proved by etching sacrificial layer under the columnar thin film. Thickness of fabricated membrane is 300nm, and the diameter of the pores in the membrane is estimated below about 10nm.
Keywords
chromium; etching; filtration; membranes; metallic thin films; microfabrication; microfluidics; nanofabrication; nanoporous materials; nickel; sputter deposition; Cr; Ni; columnar grains; etching; microfluidic channel fabrication; molecular filtration; nanoporous membrane; nanosized pores; physical vapor deposition; thin film;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on
Conference_Location
Seoul
ISSN
1944-9399
Print_ISBN
978-1-4244-7033-4
Electronic_ISBN
1944-9399
Type
conf
DOI
10.1109/NANO.2010.5697816
Filename
5697816
Link To Document