DocumentCode :
2285644
Title :
Reduction of negative differential conductivity effect of AlGaN/GaN HEMTs using gate scaling
Author :
Kundu, Sudip ; Das, Palash ; Pathak, Sant ; Mukhopadhyay, Parthak ; Reddy, Jasvardhan ; Chang, Edward Y. ; Biswas, Dhrubes
Author_Institution :
Dept. of Electron. & Electr. Commun. Eng., Indian Inst. of Technol. Kharagpur, Kharagpur, India
fYear :
2010
fDate :
17-20 Aug. 2010
Firstpage :
794
Lastpage :
797
Abstract :
Gate characteristic is one of the most important parts for the HEMTs. In this paper the DC and RF performance improvement using gate length scaling has been presented. The results show that reduction of the gate length from 1 μm to 0.15 μm, the current gain cutoff frequency increases from 12 GHz to 56 GHz and power gain cutoff frequency increases from 20.5 GHz to 63 GHz respectively. In this paper we report the first ever simulation based device structure design for reduction of Negative Differential Conductivity (NDC) effect in AlGaN/GaN HEMTs by gate length scaling.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; microwave field effect transistors; millimetre wave field effect transistors; wide band gap semiconductors; AlGaN-GaN; DC performance improvement; HEMT; RF performance improvement; gate scaling; negative differential conductivity effect;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on
Conference_Location :
Seoul
ISSN :
1944-9399
Print_ISBN :
978-1-4244-7033-4
Electronic_ISBN :
1944-9399
Type :
conf
DOI :
10.1109/NANO.2010.5697824
Filename :
5697824
Link To Document :
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