• DocumentCode
    2287129
  • Title

    Two-dimensional device simulator for cyclic bias application

  • Author

    Ohno, Y. ; Takahashi, Y.

  • Author_Institution
    Opto-Electron. Res. Labs., NEC Corp., Ibaraki, Japan
  • fYear
    1997
  • fDate
    8-10 Sept. 1997
  • Firstpage
    315
  • Lastpage
    318
  • Abstract
    A two-dimensional device simulator has been developed which searches for steady-states in cyclic bias applications. A conventional time domain device simulator calculates one period of the cyclic bias and the newly developed module finds a set of internal device parameters which gives the same values at the beginning and at the end of the unit cycle. The simulator is applied to the analysis of pulse pattern effect due to deep traps in GaAs heterojunction FETs on semi-insulating substrates.
  • Keywords
    III-V semiconductors; deep levels; field effect transistors; gallium arsenide; semiconductor device models; time-domain analysis; GaAs; cyclic bias application; deep traps; heterojunction FETs; internal device parameters; pulse pattern effect; semi-insulating substrates; time domain device simulator; two-dimensional device simulator; Circuit simulation; FETs; Frequency measurement; Gallium arsenide; Impedance measurement; Noise measurement; Semiconductor devices; Steady-state; Substrates; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 1997. SISPAD '97., 1997 International Conference on
  • Conference_Location
    Cambridge, MA, USA
  • Print_ISBN
    0-7803-3775-1
  • Type

    conf

  • DOI
    10.1109/SISPAD.1997.621401
  • Filename
    621401