DocumentCode :
228713
Title :
High SNM 32nm CNFET based 6T SRAM Cell design considering transistor ratio
Author :
Dhilleswararao, Pudi ; Mahapatra, Rajat ; Srinivas, P.S.T.N.
Author_Institution :
Dept. of Electron. & Commun. Eng., Nat. Inst. of Technol., Durgapur, India
fYear :
2014
fDate :
13-14 Feb. 2014
Firstpage :
1
Lastpage :
6
Abstract :
Carbon Nanotube Field Effect Transistor (CNFET) is best alternative to design SRAM cell in submicron range because of its excellent electrical properties, high stability, high Performance and low power dissipation in submicron range. This paper proposes a design of 6T SRAM cell based on 32nm CNFET considering nanotube diameter and transistor sizing. By using proper transistor sizing the SRAM cell shows improved performance considering noise margin and power. Compared to the traditional 32nm CMOS based 6T SRAM cell the SRAM cell increases 38% static noise margin (SNM) for read operation, increases 12% static noise margin (SNM) for standby mode operation for same cell ratio and pull up ratio. High SNM is achieved with low nanotube diameter for the SRAM cell.
Keywords :
SRAM chips; carbon nanotube field effect transistors; field effect memory circuits; CNFET; SRAM cell design; carbon nanotube field effect transistor; size 32 nm; static noise margin; transistor ratio; CMOS integrated circuits; CNTFETs; Inverters; SRAM cells; CNFET; CNT; Cell ratio; Cell stability; Pull up ratio; SNM; SRAM; chirality; nanotube diameter;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics and Communication Systems (ICECS), 2014 International Conference on
Conference_Location :
Coimbatore
Print_ISBN :
978-1-4799-2321-2
Type :
conf
DOI :
10.1109/ECS.2014.6892748
Filename :
6892748
Link To Document :
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