• DocumentCode
    228713
  • Title

    High SNM 32nm CNFET based 6T SRAM Cell design considering transistor ratio

  • Author

    Dhilleswararao, Pudi ; Mahapatra, Rajat ; Srinivas, P.S.T.N.

  • Author_Institution
    Dept. of Electron. & Commun. Eng., Nat. Inst. of Technol., Durgapur, India
  • fYear
    2014
  • fDate
    13-14 Feb. 2014
  • Firstpage
    1
  • Lastpage
    6
  • Abstract
    Carbon Nanotube Field Effect Transistor (CNFET) is best alternative to design SRAM cell in submicron range because of its excellent electrical properties, high stability, high Performance and low power dissipation in submicron range. This paper proposes a design of 6T SRAM cell based on 32nm CNFET considering nanotube diameter and transistor sizing. By using proper transistor sizing the SRAM cell shows improved performance considering noise margin and power. Compared to the traditional 32nm CMOS based 6T SRAM cell the SRAM cell increases 38% static noise margin (SNM) for read operation, increases 12% static noise margin (SNM) for standby mode operation for same cell ratio and pull up ratio. High SNM is achieved with low nanotube diameter for the SRAM cell.
  • Keywords
    SRAM chips; carbon nanotube field effect transistors; field effect memory circuits; CNFET; SRAM cell design; carbon nanotube field effect transistor; size 32 nm; static noise margin; transistor ratio; CMOS integrated circuits; CNTFETs; Inverters; SRAM cells; CNFET; CNT; Cell ratio; Cell stability; Pull up ratio; SNM; SRAM; chirality; nanotube diameter;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics and Communication Systems (ICECS), 2014 International Conference on
  • Conference_Location
    Coimbatore
  • Print_ISBN
    978-1-4799-2321-2
  • Type

    conf

  • DOI
    10.1109/ECS.2014.6892748
  • Filename
    6892748