Title :
Aqueous synthesis of n-/p-type ZnO nanorods on porous silicon for the application of p-n junction device
Author :
Park, Eunkyung ; Lee, Jungwoo ; Park, Taehee ; Lee, Jongtaek ; Lee, Donghwan ; Sung, Myung Mo ; Yi, Whikun
Abstract :
Zinc oxide (ZnO) nanorods have shown very unique properties for applications such as field emission (FE), light emitting diode (LED), transparent film of solar cell. In general, as-synthesized ZnO nanorods have n-type semiconducting properties. Many researchers have tried to grow p-type ZnO naorods for making p-n junction device. The construction of p-n junction device using ZnO nanorods is limited by producing p-type ZnO nanorods. In this work, chemical bath deposition (CBD) is used to synthesize ZnO nanorods, Before CBD a seed layer is produced by atomic layer deposition (ALD) on n-type porous silicon (PS) To fabricate p-type ZnO nanorods, nitrogen (N) from NH3 is used as doping material during seeding process. The ZnO nanorods are aligned vertically with uniform shape and length on the PS substrate. This approach opens the possibility of creating standard p-n junction device for applications as sensor arrays, piezoelectric antenna arrays, optoelectronic devices, and interconnects.
Keywords :
II-VI semiconductors; atomic layer deposition; liquid phase deposited coatings; liquid phase deposition; nanofabrication; nanorods; nitrogen; p-n junctions; semiconductor doping; semiconductor growth; semiconductor thin films; wide band gap semiconductors; zinc compounds; ALD; CBD; Si; ZnO; ZnO:N; aqueous synthesis; atomic layer deposition; chemical bath deposition; n-type ZnO nanorods; n-type porous silicon; nanorod alignment; nitrogen doping; p-n junction device; p-type zinc oxide nanorod film; seed layer; seeding process; ZnO nanorod; chemical bath deposition; p-n junction; porous silicon;
Conference_Titel :
Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on
Conference_Location :
Seoul
Print_ISBN :
978-1-4244-7033-4
Electronic_ISBN :
1944-9399
DOI :
10.1109/NANO.2010.5698022