DocumentCode
2290253
Title
Multiscale modeling of nanoscale device fabrication
Author
Dunham, Scott T.
Author_Institution
Electr. Eng. Dept., Univ. of Washington, Seattle, WA, USA
fYear
2010
fDate
17-20 Aug. 2010
Firstpage
85
Lastpage
89
Abstract
Density function theory calculations provide the foundation for hierarchical modeling of the processes controlling fabrication of nanoscale devices. The roles of atomistic methods in nanotechnology modeling are described and examples of their application given. The resulting physical models provide both deeper insight into the processes controlling device fabrication, as well as tools for technology development and optimization.
Keywords
density functional theory; nanoelectronics; nanofabrication; nanophotonics; optical fabrication; process control; semiconductor process modelling; atomistic methods; density function theory calculations; hierarchical modeling; multiscale modeling; nanoscale electronic device; nanoscale photonic device; nanotechnology modeling; physical models; processes controlling fabrication;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology (IEEE-NANO), 2010 10th IEEE Conference on
Conference_Location
Seoul
ISSN
1944-9399
Print_ISBN
978-1-4244-7033-4
Electronic_ISBN
1944-9399
Type
conf
DOI
10.1109/NANO.2010.5698065
Filename
5698065
Link To Document