DocumentCode :
2290400
Title :
A new test structure for short and long distance mismatch characterization of submicron MOS transistors
Author :
Conti, M. ; Crippa, P. ; Orcioni, S. ; Turchetti, C. ; Ricciardi, F. ; Vece, G.B.
Author_Institution :
Dipt. di Elettronica e Autom., Ancona Univ., Italy
Volume :
2
fYear :
2001
fDate :
2001
Firstpage :
656
Abstract :
A new test structure for the characterization of statistical variations of the parameters of submicron MOS devices is presented in this work. The structure has been designed for the estimation of mismatch parameters as a function of the device dimensions and positions in the die. Low area consumption and a reduced measurement time required for the complete mismatch characterization are the main objective of the design. The test structure consisting of about 6000 MOSFETs has been used for mismatch characterization of a 0.18 μm CMOS technology
Keywords :
MOSFET; semiconductor device measurement; semiconductor device testing; statistical analysis; 0.18 micron; CMOS technology; MOSFETs; device dimensions; low area consumption; measurement time; mismatch characterization; mismatch parameters; statistical variations; submicron MOS transistors; test structure; Area measurement; Automatic testing; Circuit testing; Decoding; Differential amplifiers; Electrical resistance measurement; MOS devices; MOSFET circuits; Semiconductor device modeling; Time measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Circuits and Systems, 2001. MWSCAS 2001. Proceedings of the 44th IEEE 2001 Midwest Symposium on
Conference_Location :
Dayton, OH
Print_ISBN :
0-7803-7150-X
Type :
conf
DOI :
10.1109/MWSCAS.2001.986274
Filename :
986274
Link To Document :
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