• DocumentCode
    2291653
  • Title

    Quantum confinement effect in short-channel Gate-All-Around MOSFETs and its impact on the sensitivity of threshold voltage to process variations

  • Author

    Wu, Yu-Sheng ; Su, Pin

  • Author_Institution
    Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
  • fYear
    2009
  • fDate
    5-8 Oct. 2009
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We have proposed an analytical model for quantum confinement effects in short-channel Gate-All-Around (GAA) MOSFETs. This model accurately predicts the eigen-energy shift and eigen-function modulation caused by the short channel effects in lightly doped GAA devices. It shows that the threshold voltage (Vth) variation due to channel diameter variation is larger than that due to channel length variation because of the significant quantum confinement in ultra-scaled devices. Our model indicates that the channel diameter of GAA MOSFETs can be optimized to reduce the Vth variation.
  • Keywords
    MOSFET; eigenvalues and eigenfunctions; silicon-on-insulator; channel diameter variation; channel length variation; device model; doped GAA devices; eigen-energy shift; eigen-function modulation; process variations; quantum confinement effect; short-channel gate-all-around MOSFETs; threshold voltage sensitivity; ultrascaled devices; Analytical models; Carrier confinement; Electrons; Electrostatics; MOSFETs; Potential well; Predictive models; Schrodinger equation; Semiconductor device modeling; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, 2009 IEEE International
  • Conference_Location
    Foster City, CA
  • ISSN
    1078-621X
  • Print_ISBN
    978-1-4244-4256-0
  • Electronic_ISBN
    1078-621X
  • Type

    conf

  • DOI
    10.1109/SOI.2009.5318772
  • Filename
    5318772