DocumentCode
2291653
Title
Quantum confinement effect in short-channel Gate-All-Around MOSFETs and its impact on the sensitivity of threshold voltage to process variations
Author
Wu, Yu-Sheng ; Su, Pin
Author_Institution
Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
fYear
2009
fDate
5-8 Oct. 2009
Firstpage
1
Lastpage
2
Abstract
We have proposed an analytical model for quantum confinement effects in short-channel Gate-All-Around (GAA) MOSFETs. This model accurately predicts the eigen-energy shift and eigen-function modulation caused by the short channel effects in lightly doped GAA devices. It shows that the threshold voltage (Vth) variation due to channel diameter variation is larger than that due to channel length variation because of the significant quantum confinement in ultra-scaled devices. Our model indicates that the channel diameter of GAA MOSFETs can be optimized to reduce the Vth variation.
Keywords
MOSFET; eigenvalues and eigenfunctions; silicon-on-insulator; channel diameter variation; channel length variation; device model; doped GAA devices; eigen-energy shift; eigen-function modulation; process variations; quantum confinement effect; short-channel gate-all-around MOSFETs; threshold voltage sensitivity; ultrascaled devices; Analytical models; Carrier confinement; Electrons; Electrostatics; MOSFETs; Potential well; Predictive models; Schrodinger equation; Semiconductor device modeling; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
SOI Conference, 2009 IEEE International
Conference_Location
Foster City, CA
ISSN
1078-621X
Print_ISBN
978-1-4244-4256-0
Electronic_ISBN
1078-621X
Type
conf
DOI
10.1109/SOI.2009.5318772
Filename
5318772
Link To Document