DocumentCode :
2291734
Title :
Wafer stacking: key technology for 3D integration
Author :
Lagahe-Blanchard, C. ; Aspar, B.
Author_Institution :
SOITEC, Parc Technol. des Fontaines, Crolles, France
fYear :
2009
fDate :
5-8 Oct. 2009
Firstpage :
1
Lastpage :
4
Abstract :
Wafer stacking technologies are today available for different 3D integration schemes. These are compatible with back end of line CMOS processes and packaging. Smart Stacking technology and copper to copper direct bonding processes were described as key technologies to realize dielectric or metallic bonding at room temperature and without applied pressure and/or additional glue layer. This results in a low stress stacked structure enabling high yield post process. Low temperature Smart Cuttrade is a third way to build 3D structures and bring opportunity to relax some stringent alignment constraints.
Keywords :
CMOS integrated circuits; cryogenic electronics; integrated circuit bonding; integrated circuit packaging; integrated circuit yield; silicon-on-insulator; 3D integration; 3D structures; CMOS process; IC packaging; SOI production; Si-SiO2; Smart Stacking technology; copper-to-copper direct bonding process; low-stress stacked structure; low-temperature Smart Cut; metallic bonding; wafer stacking; Bonding processes; CMOS process; CMOS technology; Copper; Dielectrics; Packaging; Stacking; Stress; Temperature; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SOI Conference, 2009 IEEE International
Conference_Location :
Foster City, CA
ISSN :
1078-621X
Print_ISBN :
978-1-4244-4256-0
Electronic_ISBN :
1078-621X
Type :
conf
DOI :
10.1109/SOI.2009.5318779
Filename :
5318779
Link To Document :
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