Title :
A monolithic integration platform for silicon photonics
Author :
Wang, Zhechao ; Junesand, Carl ; Metaferia, Wondwosen ; Hu, Chen ; Lourdudoss, Sebastian ; Wosinski, Lech
Author_Institution :
Sch. of ICT, R. Inst. of Technol. (Sweden), Kista, Sweden
Abstract :
A novel epitaxial lateral overgrowth (ELOG) technology-based monolithic integration platform for silicon photonics is demonstrated. High quality, defect-free InP ELOG mesa has been experimentally obtained on silicon by using hydride vapor phase epitaxy (HVPE). The proposed platform provides unique advantages for the realization of active devices on silicon.
Keywords :
elemental semiconductors; epitaxial growth; integrated optics; silicon; active devices realization; defect-free ELOG; epitaxial lateral overgrowth technology-based monolithic integration platform; hydride vapor phase epitaxy; photonics; Epitaxial growth; Indium phosphide; Monolithic integrated circuits; Photonics; Scanning electron microscopy; Silicon; Surface treatment;
Conference_Titel :
Information Photonics (IP), 2011 ICO International Conference on
Conference_Location :
Ottawa, ON
Print_ISBN :
978-1-61284-315-5
DOI :
10.1109/ICO-IP.2011.5953715
