Title :
MIM Capacitors Based on
Featuring Record-Low VCC and Excellent Reliability
Author :
Chia-Chun Lin ; Yung-Hsien Wu ; Ren-Siang Jiang ; Meng-Ting Yu
Author_Institution :
Dept. of Eng. & Syst. Sci., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Abstract :
Perovskite-based BaZryTi1-yO3 (BZTO) (y=0.6) with partial crystallization has been found to possess a rather high- κ value of 48.6 and positive quadratic voltage coefficient of capacitance (VCC). Through stacking BZTO and ZrTiOx as laminate dielectric, metal-insulator-metal capacitors using VCC canceling effect advance frontiers by exhibiting a record-low VCC of 14 ppm/V2 at the capacitance of 13.4 fF/μm2, low dielectric loss tangent , and low leakage current of 7.5×10-9 A/cm2 at -1 V. With constant voltage stress at 2.5 V for 1000 s, degradation in leakage current is observed. In addition, excellent reliability of 0.89% capacitance change against stress up to a projected of 10 years is also achieved. The aforementioned characteristics not only compare favorably to other high- κ-based dielectrics, most importantly, but also these results meet ITRS requirements set by 2024.
Keywords :
MIM devices; barium compounds; capacitance; capacitors; dielectric losses; high-k dielectric thin films; leakage currents; semiconductor device reliability; zirconium compounds; MIM capacitors; ZrTiOx-BaZryTi1-yO3; constant voltage stress; dielectric loss tangent; high-κ value; laminate dielectric; leakage current; metal-insulator-metal capacitors; partial crystallization; positive quadratic voltage coefficient of capacitance; reliability; voltage -1 V; voltage 2.5 V; Capacitance; Dielectrics; Laminates; Leakage currents; MIM capacitors; Reliability; Stress; ${rm BaZr}_{rm y}{rm Ti}_{rm 1-y}{rm O}_{3}$; conduction mechanism; dielectric loss; frequency dispersion; leakage current; metal–insulator–metal (MIM) capacitors; perovskite; reliability;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2013.2281935