Title :
TriPleX™ platform technology for photonic integration: Applications from UV through NIR to IR
Author :
Leinse, A. ; Heideman, R.G. ; Klein, E.J. ; Dekker, R. ; Roeloffzen, C.G.H. ; Marpaung, D.A.I.
Author_Institution :
LioniX bv, Enschede, Netherlands
Abstract :
The CMOS compatible fabrication equipment, the transparency from UV to IR and the capability of batch processing make the TriPleX™ waveguide platform very suitable for a large variety of applications. In this paper a description of the technology and examples of applications in different wavelength ranges are given. These applications exploit the low loss properties at relatively high index contrasts in the TriPleX™ technology.
Keywords :
CMOS integrated circuits; integrated optics; optical waveguides; CMOS compatible fabrication equipment; IR; TriPleX platform technology; UV; batch processing; photonic integration; Broadband antennas; Optical beams; Optical device fabrication; Optical filters; Optical waveguides; Photonics;
Conference_Titel :
Information Photonics (IP), 2011 ICO International Conference on
Conference_Location :
Ottawa, ON
Print_ISBN :
978-1-61284-315-5
DOI :
10.1109/ICO-IP.2011.5953782
