Title :
Semiconductor manufacturing process visualization
Author :
McNames, James ; Abercrombie, David ; Turner, David ; Shannon, Thaddeus
Author_Institution :
IC Design & Test Lab, Portland State Univ., OR, USA
Abstract :
This paper describes a new graphical display of semiconductor manufacturing processes. The display shows the tool usage at each step and the frequency of transitions between adjacent steps using a normalized nonlinear color map. We use normalized entropy and conditional entropy to quantify how close the tool usage and transition frequencies are to an ideal uniform mixing process. The display also shows the steps for which a fraction of the data was lost. Throughout the display we used color to emphasize different process conditions: red represents alarm conditions and is designed to draw attention; white represents normal, expected conditions; and blue represents lower than normal usage. We designed the display to convey useful information and help process engineers visualize large data sets. This enables fast identification of violations in the assumptions of typical statistical process control techniques and data integrity problems.
Keywords :
computerised monitoring; data integrity; mixing; process monitoring; semiconductor technology; statistical process control; conditional entropy; data integrity problems; graphical display; normalized entropy; normalized nonlinear color map; process conditions; process monitoring; process visualization; semiconductor manufacturing processes; statistical process control techniques; tool usage; transition frequency; transition probabilities; trellis diagram; uniform mixing process; Data engineering; Design engineering; Displays; Frequency; Integrated circuit testing; Large scale integration; Logic testing; Manufacturing processes; Monitoring; Visualization;
Conference_Titel :
Systems, Man and Cybernetics, 2003. IEEE International Conference on
Print_ISBN :
0-7803-7952-7
DOI :
10.1109/ICSMC.2003.1245765